Sintered compact target and method of producing sintered compact
AssigneeJX Nippon Mining & Metals Corporation
InventorsHideaki FUKUYO, Masataka YAHAGI, Yasuhiro YAMAKOSHI, Hideyuki TAKAHASHI
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AssigneeJX Nippon Mining & Metals Corporation
InventorsHideaki FUKUYO, Masataka YAHAGI, Yasuhiro YAMAKOSHI, Hideyuki TAKAHASHI
Estimating the term…
A sintered compact target containing an element(s) (A) and an element(s) (B) as defined below is provided. The sintered compact target is free from pores having an average diameter of 1 μm or more, and the number of micropores having an average diameter of less than 1 μm existing in 40000 μm2 of the target surface is 100 micropores or less. The element(s) (A) is one or more chalcogenide elements selected from S, Se, and Te, and the element(s) (B) is one or more Vb group elements selected from Bi, Sb, As, P, and N. The provided technology is able to eliminate the source of grain dropping or generation of nodules in the target during sputtering, and additionally inhibit the generation of particles.
A method of producing a sintered compact containing an element (A) and an element (B), comprising the steps of:
A method of producing a sintered compact containing an element (A), an element (B) and one or more elements selected from (C) or (D), comprising the steps of:
Dependencies are inferred from the claim text.