Charged Particle Beam Device and Charged Particle Beam Adjustment Method
AssigneeHitachi High-Tech Corporation
InventorsHitomi SAKAI, Daisuke SATO, Keiichiro HITOMI, Hiroyuki SAITO, Kazuma TANII
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AssigneeHitachi High-Tech Corporation
InventorsHitomi SAKAI, Daisuke SATO, Keiichiro HITOMI, Hiroyuki SAITO, Kazuma TANII
Estimating the term…
Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lens 3 and an objective lens 14 configured to focus an electron beam 4 emitted from an electron source 2, a primary beam scanning deflector 5 or a secondary electron deflector 15, an adjusting element 13 configured to adjust an axis of the electron beam 4, and a control device 9 configured to supply a signal representing a control amount to the adjusting element 13 for control. The control device 9 is configured to determine the control amount by using a change amount of an intensity of the condenser lens 3, the objective lens 14, the primary beam scanning deflector 5, or the secondary electron deflector 15, and a calculation formula or a table showing a relation between the change amount of the intensity and the control amount.
A charged particle beam device comprising:
A charged particle beam adjustment method by a charged particle beam device, the device including
Dependencies are inferred from the claim text.