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US 2021/0232012 A1Published application
Multilayered thin film transparent electrode for electrochromic device and manufacturing method thereof
AssigneeCHEONGJU University Industry & Academy Cooperation Foundation
InventorSang Yeol LEE
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Abstract
Provided is a multilayered thin film transparent electrode for an electrochromic device including: a substrate; a lower oxide layer located on the substrate; a metal layer located on the lower oxide layer; and an upper oxide layer located on the metal layer, and a thickness of a center portion of the metal layer is larger than a thickness of an edge.
Claims11
A multilayered thin film transparent electrode for an electrochromic device, comprising:
- a substrate;
- a lower oxide layer located on the substrate;
- a metal layer located on the lower oxide layer;
- and
- an upper oxide layer located on the metal layer,
- wherein a thickness of a center portion of the metal layer is larger than a thickness of an edge.
3 more elements
A manufacturing method of a multilayered thin film transparent electrode for an electrochromic device, the method comprising:
- preparing a substrate;
- forming a lower oxide layer on the substrate;
- forming a metal layer in which a thickness of a center portion is larger than that of an edge, on the lower oxide layer;
- and
- forming an upper oxide layer on the metal layer.
2 more elements
Dependencies are inferred from the claim text.