Optical arrays, filter arrays, optical devices and method of fabricating same
AssigneeAttonics Systems Pte Ltd
InventorsSascha Pierre Heussler, Shuvan Prashant Turaga, Sri Harsha Kasi Raj, Herbert Oskar Moser, Erich Pantele
Life of this patent
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Abstract
Disclosed are optical arrays and optical devices that can be operated in narrow and wide spectral bands and at high spectral resolutions. Disclosed also are filter arrays with replicated etalon units that can function as bandpass filters. Disclosed further are methods for manufacturing optical arrays, filter arrays, and optical devices having such optical or filter arrays.
Claims94
A method for manufacturing one or more optical arrays, the method comprising:
- (A) providing a substrate comprising a first polymer layer sensitive to a radiation;
- (B) providing a single mask comprising a first mask portion configured to block the radiation and one or more second mask portions configured to allow the radiation to pass through, wherein each second mask portion in the one or more second mask portions has a first dimension in a first direction and a second dimension in a second direction, wherein the second direction is different from the first direction;
- (C) positioning the substrate and the mask relative to each other at each relative position in a first plurality of relative positions along the first direction, wherein a distance between adjacent relative positions in the first plurality of relative positions is equal to or less than the first dimension of any second mask portion in the one or more second mask portions;
- (D) exposing, at each respective relative position in the first plurality of relative positions, the first polymer layer through the mask to a corresponding dose in a first plurality of doses of the radiation, thereby producing one or more first exposed polymer portions in the first polymer layer;
- (E) positioning the substrate and the mask relatively to each other at each relative position in a second plurality of relative positions along the second direction, wherein a distance between adjacent relative positions in the second plurality of relative positions is equal to or less than the second dimension of any second mask portion in the one or more second mask portions;
- and
- (F) exposing, at each respective relative position in the second plurality of relative positions, the first polymer layer through the mask to a corresponding dose in a second plurality of doses of the radiation, thereby producing one or more second exposed polymer portions in the first polymer layer;
- wherein each respective second exposed polymer portion in the one or more second exposed polymer portions overlaps at least partially with each corresponding first exposed polymer portion in the one or more first portions, thereby producing one or more overlapped exposed polymer portions, each overlapped exposed polymer portion creates an array of dosed segments, wherein each dosed segment in the array of dosed segments is exposed to a different dose of the radiation.
A method for manufacturing one or more optical arrays, the method comprising:
- (A1) providing a substrate comprising a first polymer layer sensitive to a radiation;
- (B1) providing a single mask comprising a first mask portion configured to block the radiation and one or more second mask portions configured to allow the radiation to pass through, wherein each second mask portion in the one or more second mask portions has a first dimension in a first direction and a second dimension in a second direction, wherein the second direction is different from the first direction;
- (C1) positioning the substrate and the mask relative to each other at each relative position in an array of relative positions, wherein a distance between two adjacent relative positions along the first direction is equal tom the first dimension of any second mask portion in the one or more second mask portions, and a distance between two adjacent relative positions along the second direction is equal to the second dimension of any second mask portion in the one or more second mask portions;
- and
- (D1) exposing, at each respective relative position in the array of relative positions, the first polymer layer through the mask to a corresponding dose in an array of doses of the radiation, thereby producing one or more final exposed polymer portions in the first polymer layer, each final exposed polymer portion comprising an array of dosed segments, wherein each dosed segment in the array of dosed segments is exposed to a different dose of the radiation.
A method for one or more optical arrays, the method comprising:
- (A) providing a master comprising one or more patterned structures, each patterned structure comprising an array of segments at different heights;
- (B) creating a replica comprising a first polymer layer, wherein the first polymer layer comprises one or more replicated structures, each replicated structure corresponding to a patterned structure in the one or more structures of the master, each replicated structure comprising an array of first surfaces at different depths corresponding to the array of segments at different heights;
- (C) depositing a layer of first reflective material on the first surfaces of each replicated structure in the one or more replicated structures, thereby producing a first reflective layer on the first surfaces of each replicated structure in the one or more replicated structures;
- (D) casting, subsequent to the depositing (C), a second polymer layer to the one or more replicated structures, wherein the second polymer layer comprises a planar polymer surface over each replicated structure in the one or more replicated structures;
- and
- (E) depositing, subsequent to the casting (D), a layer of second reflective material on the planar polymer surface over each replicated structure in the one or more replicated structures, thereby producing a second reflective layer on the planar polymer surface over each replicated structure in the one or more replicated structures;
- wherein corresponding to each replicated structure in the one or more replicated structures, an optical array is formed by the first reflective layer, the second reflective layer and the second polymer layer in-between.
A method, comprising:
- (A) providing a master comprising one or more patterned structures, each patterned structure comprising an array of segments at different heights;
- (B) creating a replica comprising a first polymer layer, wherein the first polymer layer comprises one or more replicated structures, each replicated structure corresponding to a patterned structure in the one or more structures of the master, each replicated structure comprising an array of first surfaces at different depths corresponding to the array of segments at different heights;
- (C) depositing a layer of first reflective material on the first surfaces of each replicated structure in the one or more replicated structures, thereby producing a first reflective layer on the first surfaces of each replicated structure in the one or more replicated structures;
- and
- (D) overlaying the first polymer layer on a substrate comprising a layer of second reflective material;
- wherein corresponding to each replicated structure in the one or more replicated structures, an optical array is formed by the first reflective layer, a second reflective layer formed by the layer of second reflective material, and the first polymer layer in-between.
A method for manufacturing one or more filter arrays each with replicated units, the method comprising:
- (A) providing a substrate comprising a first polymer layer sensitive to a radiation;
- (B) providing a single mask comprising a first mask portion and one or more second mask portion arrays, wherein the first mask portion is configured to block the radiation, and each second mask portion array in the one or more second mask portion arrays comprises an array of second mask portions configured to allow the radiation to pass through, wherein each second mask portion in the array of second mask portions has a first dimension in a first direction and a second dimension in a second direction, wherein the second direction is different from the first direction;
- (C) positioning the substrate and the mask relative to each other at each relative position in an array of relative positions, wherein a distance between two adjacent relative positions along the first direction is equal to in the first dimension of any second mask portion in the array of second mask portions, and a distance between two adjacent relative positions along the second direction is equal to the second dimension of any second mask portion in the array of second mask portions;
- and
- (D) exposing, at each respective relative position in the array of relative positions, the first polymer layer through the mask to a corresponding dose in an array of doses of the radiation, thereby producing one or more exposed polymer portions in the first polymer layer, wherein each exposed polymer portion comprises an array of dosed units and each dosed unit comprises an array of dosed segments, wherein of each dosed unit, at least two dosed segments are exposed to different doses of the radiation.
A method for mass replicating one or more filter arrays each with replicated units, the method comprising:
- (A) providing a master comprising one or more patterned structures, each patterned structure comprising an array of structure unit, each structure unit comprising an array of segments, wherein of each structure unit, at least two segments in the array of segments are at different heights;
- (B) creating a replica comprising a first polymer layer, wherein the first polymer layer comprises one or more replicated structures, each replicated structure corresponding to a patterned structure in the one or more structures of the master, each replicated structure comprising an array of replicated structure units, each replicated structure unit comprising an array of first surfaces, wherein of each replicated structure unit, at least two first surfaces in the array of first surfaces are at different depths;
- (C) depositing a layer of first reflective material on the first surfaces of each replicated structure in the one or more replicated structures, thereby producing a first reflective layer on the first surfaces of each replicated structure unit of each replicated structure in the one or more replicated structures;
- (D) casting, subsequent to the depositing (C), a second polymer layer to the one or more replicated structures, wherein the second polymer layer comprises a planar polymer surface over each replicated structure in the one or more replicated structures;
- and
- (E) depositing, subsequent to the casting (D), a layer of second reflective material on the planar polymer surface over each replicated structure in the one or more replicated structures, thereby producing a second reflective layer on the planar polymer surface over each replicated structure in the one or more replicated structures;
- wherein corresponding to each replicated structure in the one or more replicated structures, an optical array is formed by the first reflective layer, the second reflective layer and the second polymer layer in-between.
A method for mass replicating one or more filter arrays each with replicated units, the method comprising:
- (A) providing a master comprising one or more patterned structures, each patterned structure comprising an array of structure unit, each structure unit comprising an array of segments, wherein of each structure unit, at least two segments in the array of segments are at different heights;
- (B) creating a replica comprising a first polymer layer, wherein the first polymer layer comprises one or more replicated structures, each replicated structure corresponding to a patterned structure in the one or more structures of the master, each replicated structure comprising an array of replicated structure units, each replicated structure unit comprising an array of first surfaces, wherein of each replicated structure unit, at least two first surfaces in the array of first surfaces are at different depths;
- (C) depositing a layer of first reflective material on the first surfaces of each replicated structure in the one or more replicated structures, thereby producing a first reflective layer on the first surfaces of each replicated structure unit of each replicated structure in the one or more replicated structures;
- and
- (D) overlaying the first polymer layer on a substrate comprising a layer of second reflective material;
- wherein corresponding to each replicated structure in the one or more replicated structures, an optical array is formed by the first reflective layer, a second reflective layer formed by the layer of second reflective material, and the first polymer layer in-between.
An optical array comprising:
- at least 1000 etalons, each having a different depth and configured to generate a different transmission pattern when impinged by a light, such that the optical array enables recovery of both narrow and wide spectral bands at high spectral resolutions.
An optical array comprising:
- an array of etalons, each etalon having a different depth and configured to generate a different transmission pattern when impinged by a light, wherein the depths of at least two etalons in the array differ from each other by two to three orders of magnitude, such that the optical array enables recovery of both narrow and wide spectral bands at high spectral resolutions.
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Dependencies are inferred from the claim text.