Integrated optical devices and methods of forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChan-Hong Chern, Min-Hsiang Hsu
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Abstract
Integrated optical devices and methods of forming the same are disclosed. A method of forming an integrated optical device includes the following steps. A substrate is provided. The substrate includes, from bottom to top, a first semiconductor layer, an insulating layer and a second semiconductor layer. The second semiconductor layer is patterned to form a waveguide pattern. A surface smoothing treatment is performed to the waveguide pattern until a surface roughness Rz of the waveguide pattern is equal to or less than a desired value. A cladding layer is formed over the waveguide pattern.
Claims20
A method of forming an integrated optical device, comprising:
- forming a waveguide pattern;
- performing a surface smoothing treatment to the waveguide pattern;
- and
- forming a nitrided oxide layer on a sidewall of the waveguide pattern.
A method of forming an integrated optical device, comprising:
- providing a substrate comprising, from bottom to top, a first semiconductor layer, an insulating layer and a second semiconductor layer;
- forming a patterned hard mask layer on the second semiconductor layer;
- patterning the second semiconductor layer by using the patterned hard mask as a mask, so as to form a waveguide pattern;
- forming an insulating layer on the waveguide pattern;
- and
- nitridizing the insulating layer to form a nitrided oxide layer.
An integrated optical device, comprising:
- a waveguide pattern, disposed on an insulating layer and comprising a strip portion;
- a nitrided oxide layer, disposed on a sidewall of the strip portion of the waveguide pattern and on a surface of the insulating layer;
- and
- a cladding layer, disposed over the nitrided oxide layer.
Dependencies are inferred from the claim text.