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US 2021/0230374 A1Published application
Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton
AssigneeMerck Patent GmbH
InventorsTakashi FUJIWARA, Yuji TASHIRO
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Abstract
[Problem] To provide a novel polymer, which fills trenches having narrow widths and high aspect ratios and can form a thicker film. [Means for Solution] The block copolymer comprises a linear or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon.
Claims17
A block copolymer comprising:
- a linear or cyclic block A having a polysilane skeleton comprising 5 or more silicon;
- and
- a block B having a polysilazane skeleton comprising 20 or more silicon,
- wherein at least one silicon in the block A and at least one silicon in the block B are connected by a single bond and/or a crosslinking group comprising silicon.
1 more element
Dependencies are inferred from the claim text.