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US 2021/0229986 A1Published application
Microelectromechanical structure including a functional element situated in a cavity of the microelectromechanical structure
AssigneeRobert Bosch GmbH
InventorsPenny Weir, Markus Kuhnke, Stefan Majoni
Life of this patent
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Abstract
A microelectromechanical structure, including a functional element situated in a cavity of the microelectromechanical structure. The functional element includes an aluminum nitride layer. The cavity is closed by a cap layer. The cap layer includes epitaxial silicon. A method for manufacturing a micromechanical structure is also described.
Claims12
1-11. (canceled)
A microelectromechanical structure, comprising:
- a functional element situated in a cavity of the microelectromechanical structure, the functional element including an aluminum nitride layer;
- wherein the cavity is closed by a cap layer, the cap layer including epitaxial silicon.
A method for manufacturing a micromechanical structure, comprising:
- providing a functional element in a cavity, the functional element including an aluminum nitride layer;
- after the providing, closing the cavity with a cap layer, the cap layer including epitaxial silicon.
Dependencies are inferred from the claim text.