Ultra-thin, high-porosity, track-etched membranes
AssigneeLockheed Martin Corporation
InventorsScott E. Heise, Lawrence William Mason, Jacob Louis Swett, Han Liu
Life of this patent
Estimating the term…
Loading patent…
AssigneeLockheed Martin Corporation
InventorsScott E. Heise, Lawrence William Mason, Jacob Louis Swett, Han Liu
Estimating the term…
Systems and methods described herein may produce a modified substrate. A process for producing a modified substrate may include providing a substrate that is 5 microns or less in thickness, ion tracking the substrate, and etching the tracked substrate with an etchant to produce a plurality of pores in the substrate. In some implementations, the substrate may be a polymer. In some implementations, the ion tracking may include controlling a flux of ions passing through the substrate to achieve a desired pore density. In some implementations, the track-etching of the substrate may create a 10% or more porosity in the substrate. In some implementations, the process may further include using the track-etched substrate as a support substrate for at least one of a single-layer graphene film, multi-layer graphene film, stack of graphene films, nanostructure of graphene flakes, or nanostructure of graphene platelets.
A method for producing a modified substrate, comprising:
A membrane, comprising:
A high-selectivity filtration membrane, comprising:
Dependencies are inferred from the claim text.