Methods for forming large area diamond substrates
AssigneesBoard of Trustees of Michigan State University, Fraunhofer USA, Inc.
InventorsTimothy A. Grotjohn, Ramon Diaz, Aron Hardy
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AssigneesBoard of Trustees of Michigan State University, Fraunhofer USA, Inc.
InventorsTimothy A. Grotjohn, Ramon Diaz, Aron Hardy
Estimating the term…
The disclosure relates to large area single crystal diamond (SCD) surfaces and substrates, and their methods of formation. Typical large area substrates can be at least about 25 mm, 50 mm, or 100 mm in diameter or square edge length, and suitable thicknesses can be about 100 μm to 1000 μm. The large area substrates have a high degree of crystallographic alignment. The large area substrates can be used in a variety of electronics and/or optics applications. Methods of forming the large area substrates generally include lateral and vertical growth of SCD on spaced apart and crystallographically aligned SCD seed substrates, with the individual SCD growth layers eventually merging to form a composite SCD layer of high quality and high crystallographic alignment. A diamond substrate holder can be used to crystallographically align the SCD seed substrates and reduce the effect of thermal stress on the formed SCD layers.
A method for forming a large area single crystal diamond (SCD) surface, the method comprising:
A large area single crystal diamond (SCD) substrate comprising:
Dependencies are inferred from the claim text.