Carbon-doped silicon dioxide glass and methods of manufacturing thereof
AssigneeCorning Incorporated
InventorsYunfeng Gu, Nicolas LeBlond, Ming-Jun Li, Jeffery Scott Stone, Haitao Zhang
Life of this patent
Estimating the term…
Abstract
A silica-based substrate includes a glass phase and a dispersed phase having carbon, such that the silica-based substrate has a thickness of at least 10 gm. Also disclosed is a method of forming a silica-based substrate, the method including contacting a porous silica soot preform with an organic solution having at least one hydrocarbon precursor to form a doped silica soot preform and heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate.
Claims20
A silica-based substrate comprising:
- a glass phase;
- a dispersed phase comprising carbon,
- wherein the silica-based substrate has a thickness of at least 10 μm.
2-10. (canceled)
12-18. (canceled)
A method of forming a silica-based substrate, the method comprising:
- contacting a porous silica soot preform with an organic solution comprising at least one hydrocarbon precursor to form a doped silica soot preform;
- heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate.
Dependencies are inferred from the claim text.