Microelectronic devices and memory devices
AssigneeMicron Technology, Inc.
InventorsSi-Woo Lee, Kyuseok Lee, Sangmin Hwang
Life of this patent
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AssigneeMicron Technology, Inc.
InventorsSi-Woo Lee, Kyuseok Lee, Sangmin Hwang
Estimating the term…
A method of forming a microelectronic device comprises forming a spacer structure having a rectangular ring horizontal cross-sectional shape over a transistor, a portion of the spacer structure horizontally overlapping a drain region of the transistor. A masking structure is formed over the spacer structure and the transistor, the masking structure exhibiting an opening therein horizontally overlapping the drain region of the transistor and the portion of the spacer structure. A portion of an isolation structure overlying the drain region of the transistor is removed using the masking structure and the portion of the spacer structure as etching masks to form a trench vertically extending through the isolation structure to the drain region of the transistor. A drain contact structure is formed within the trench in the isolation structure. Microelectronic devices, memory devices, and electronic systems are also described.
A microelectronic device, comprising:
A memory device, comprising:
A microelectronic device, comprising:
Dependencies are inferred from the claim text.