Etching solution, touch panel and manufacturing method thereof
AssigneeCambrios Film Solutions Corporation
InventorsChung-Chin Hsiao, Siou-Cheng Lien, Chi-Fan Hsiao, Chia-Yang Tsai, Yi-Wen Chiu
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AssigneeCambrios Film Solutions Corporation
InventorsChung-Chin Hsiao, Siou-Cheng Lien, Chi-Fan Hsiao, Chia-Yang Tsai, Yi-Wen Chiu
Estimating the term…
The present disclosure discloses an etching solution, a touch panel, and a manufacturing method thereof. The manufacturing method of the touch panel includes the following operations. A substrate is provided, in which the substrate has a visual area and a peripheral area. A metal layer and a metal nanowire layer are disposed, in which a first portion of the metal nanowire layer is disposed in the visual area, and a second portion of the metal nanowire layer and the metal layer are disposed in the peripheral area. A patterning step is performed. The patterning step includes simultaneously forming multiple peripheral wires and the second portion of the metal nanowire layer by using the etching solution for etching the metal layer and the metal nanowire layer.
A manufacturing method of a touch panel, comprising:
An etching solution used for performing a patterning step, comprising:
An etching solution used for performing a patterning step, comprising:
A manufacturing method of a touch panel, comprising:
Dependencies are inferred from the claim text.