Multi-mirror uv-led optical lithography system

An optical lithography system comprising:

• a polygonal structure having a central region and a central axis;
• an ultra-violet (UV) light source positioned in the polygonal structure, the UV light source including one or more UV light emitting diodes (LEDs) forming a plurality of UV LED modules detachably disposed in the central region or at an end of the polygonal structure;
• a light parallelizer positioned in the polygonal structure for creating substantially parallel light rays from the UV light source exiting the polygonal structure before reaching a lithography target adjacent to an exit of the polygonal structure, the light parallelizer comprising:
• a plurality of mirrors including at least first, second, and third mirrors arranged such that the first mirror receives incident light from the UV light source and reflects the incident light from the first mirror towards the second mirror, the second mirror receiving the reflected light as a second incident light and reflecting the second incident light from the second mirror towards the third mirror to create a spiral light path from the UV light source to the lithography target with light incident on the lithography target being substantially parallel;
• wherein at least two of the first, second, and third mirrors are concave curved mirrors, the curvature of each of the two concave curved mirrors being different from each other.