Resist composition and method of forming resist pattern

A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:

• a resin component (Ab1) exhibiting changed solubility in a developing solution under action of acid;
• and
• a compound (D0) represented by General Formula (d0),
• wherein the resin component (Ab1) has a constitutional unit (a01) containing an acid-decomposable group having a polarity which is increased by action of an acid and a constitutional unit (a02) derived from a compound represented by General Formula (a02-1), and
• a solid content concentration is 5% by mass or less:
• Rd0-Xd0-Yd0-COO⊖(Mm⊕)1/m (d0)
• wherein Rd0 represents a monovalent organic group, Xd0 represents —O—, —C(═O)—, —O—C(═O)—, —C(═O)—O—, —S—, or —SO2—, Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent or, M′m+ represents an m-valent organic cation, and m represents an integer of 1 or greater:
• wherein W represents a polymerizable group-containing group, Wax0 represents a cyclic group having an (nax0+1)-valent aromaticity, which may have a substituent, Wax0 may form a condensed ring with W, and nax0 represents an integer in a range of 1 to 3.