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US 2021/0200084 A1Published application
Polymers and photoresist compositions
OwnerJong Keun Park, Emad Aqad +4inventors
InventorsJong Keun Park, Emad Aqad, Yang Song, Chunyi Wu, Colin Liu, Mingqi Li
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Abstract
A polymer comprising a first repeating unit derived from a monomer comprising a hydroxy-aryl group; a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group; a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group; and a fourth repeating unit derived from a monomer comprising an acid-sensitive group, wherein the first, the second, the third, and the fourth repeating units are different from each other.
Claims10
A polymer comprising:
- a first repeating unit derived from a monomer comprising a hydroxy-aryl group;
- a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group;
- a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group;
- and
- a fourth repeating unit derived from a monomer comprising an acid-sensitive group,
- wherein the first repeating unit, the second repeating unit, the third repeating unit, and the fourth repeating unit are different from each other.
3 more elements
Dependencies are inferred from the claim text.