Detection component including black pixels and method for manufacturing such a component
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsJérôme LE PERCHEC, Giacomo BADANO
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Abstract
The invention relates to a detection component (1) for detecting electromagnetic radiation comprising at least one mask (140) arranged to block the electromagnetic radiation for at least one of the detection structures (122). The opaque mask (140) comprises a successive stack of a first metal layer (141), a second metal layer (142), a third transparent layer (143) having a low optical index, and an assembly of metal elements (144). The second metal layer (142), the transparent layer (143), and the assembly of metal elements (144) form MIM structures in the wavelength range. The invention further relates to a method for manufacturing such a component (1).
Claims19
A detection component for detecting electromagnetic radiation in a wavelength range, the detection component comprising:
- a support comprising an active layer in which a plurality of structures for detecting electromagnetic radiation in said wavelength range is arranged, the support comprising a first surface from which the active layer extends, and a second surface opposite the first surface, with the support being intended to receive the electromagnetic radiation via the second surface,
- at least one opaque mask arranged on a portion of the second surface of the support to block the electromagnetic radiation for at least one of the detection structures, called a masked structure,
- wherein the opaque mask comprises at least a first, a second, and a third metal, and a transparent material with a refractive index less than or equal to 2 in the wavelength range, the first metal having an extinction coefficient km1 greater than or equal to 5nm1, the second metal having an extinction coefficient km3 strictly less than 5 nm2, and the third metal having an extinction coefficient km3 strictly less than 5nm3, with nm1, nm2, and nm3 being the refractive indices of the first metal, second metal, and third metal, respectively, in the wavelength range, with the transparent material having an extinction coefficient kt less than or equal to 0.01,
- wherein the opaque mask comprises, starting from the second surface of the support, a successive stack of:
- a first metal layer made of the first metal,
- a second metal layer made of the second metal,
- a third transparent layer made of the transparent material, and
- an assembly of the metal elements comprising the third metal, said assembly of the metal elements being arranged on the transparent layer opposite the second metal layer,
- and wherein the second metal layer, the transparent layer, and the assembly of the metal elements form the first MIM structures in the wavelength range.
A method for manufacturing a detection component for detecting electromagnetic radiation in a wavelength range, the manufacturing method comprising:
- providing a support comprising an active layer in which a plurality of structures for detecting electromagnetic radiation in said wavelength range is arranged, the support comprising a first surface from which the active layer extends, and a second surface opposite the first surface, the support being intended to receive the electromagnetic radiation via the second surface,
- starting from the second surface of the support, the formation of a successive stack of:
- a first metal layer made of a first metal,
- a second metal layer made of a second metal,
- a third transparent layer made of a transparent material with a refractive index less than or equal to 2 in the wavelength range, and
- an assembly of metal elements comprising a third metal, said assembly of metal elements being arranged on the transparent layer opposite the second metal layer, with the second metal layer, the transparent layer, and the assembly of metal elements forming MIM structures in the wavelength range,
- the opaque mask being arranged on a portion of the second surface of the support to block the electromagnetic radiation for at least one of the detection structures, called a masked structure,
- in which method the opaque mask comprises the first, the second, and the third metal, and the transparent material, with the first metal having an extinction coefficient km1 greater than or equal to 5nm1, and the second metal having an extinction coefficient km3 strictly less than 5nm2, and the third metal an extinction coefficient km3 strictly less than 5nm3, with nm1, nm2, and nm3 being the refractive indices of the first metal, the second metal, and the third metal, respectively, in the wavelength range, with the transparent material having an extinction coefficient kt less than or equal to 0.01.
Dependencies are inferred from the claim text.