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US 2021/0198474 A1Published application
Block copolymer, preparation method thereof, and thin film structure comprising the same
AssigneeIndustrial Technology Research Institute
InventorsMeei-Yu HSU, Yi-Chun CHEN, Kai-Chi CHEN
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Abstract
A block copolymer is provided. The block copolymer includes a first block including repeat units represented by formula (I), and a second block connected to the first block and including repeat units represented by formula (II) or (III). The disclosure also provides a method for preparing the block copolymer and a thin film structure including the same.
Claims16
A block copolymer, comprising:
- a first block comprising repeat units represented by formula (I):
- wherein R comprises hydrogen or methyl, and R′ comprises C1-5 alkyl;
- and
- a second block connected to the first block, wherein the second block comprises repeat units represented by formula (II) or (III):
- wherein R comprises hydrogen or methyl, R′ comprises C1-5 alkyl, and R1 and R2, independently, comprise C1-C8 alkyl.
2 more elements
A method for preparing a block copolymer, comprising:
- mixing a chain transfer reagent, a first free radical initiator, a zwitterionic monomer, and a first hydrophobic monomer to prepare a block copolymer precursor;
- and
- mixing a second free radical initiator, a second hydrophobic monomer, and the block copolymer precursor to prepare a block copolymer.
Dependencies are inferred from the claim text.