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US 2021/0197237 A1Published application
Chemical supply unit, substrate processing apparatus, and substrate processing method
AssigneeSemes Co., Ltd.
InventorsTae Suk YUN, Hyeon Suk PARK
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Abstract
An apparatus for processing a substrate includes a housing having a processing space in which the substrate is processed, a support unit that supports the substrate in the processing space, a nozzle that dispenses a chemical onto the substrate placed on the support unit, a chemical supply unit that supplies the chemical to the nozzle, and a controller that controls the chemical supply unit.
Claims12
An apparatus for processing a substrate, the apparatus comprising:
- a housing having a processing space in which the substrate is processed;
- a support unit configured to support the substrate in the processing space;
- a nozzle configured to dispense a chemical onto the substrate placed on the support unit;
- a chemical supply unit configured to supply the chemical to the nozzle;
- and
- a controller configured to control the chemical supply unit,
- wherein the chemical supply unit includes:
- a tank having an interior space in which the chemical is stored;
- a sensor configured to detect a residual amount of the chemical stored in the interior space of the tank;
- an inlet line through which the chemical is supplied from a chemical supply source to the interior space of the tank and in which an inlet valve is installed;
- an outlet line through which the chemical is supplied from the interior space of the tank to the nozzle and in which an outlet valve is installed;
- and
- a drain line through which the chemical in the interior space of the tank is drained and in which a drain valve is installed, and
- wherein the controller controls the chemical supply unit to supply a new chemical from the chemical supply source to the tank in a state in which the chemical remains in the interior space of the tank, when the residual amount detected by the sensor reaches a first preset amount or less.
11 more elements
A chemical supply unit for supplying a chemical, the chemical supply unit comprising:
- a tank having an interior space in which the chemical is stored;
- a sensor configured to detect a residual amount of the chemical stored in the interior space of the tank;
- an inlet line through which the chemical is supplied from a chemical supply source to the interior space of the tank and in which an inlet valve is installed;
- an outlet line through which the chemical is supplied from the interior space of the tank to an object to be processed and in which an outlet valve is installed;
- a drain line through which the chemical in the interior space of the tank is drained and in which a drain valve is installed;
- and
- a controller configured to control the chemical supply unit,
- wherein the controller controls the chemical supply unit to supply a new chemical from the chemical supply source to the tank in a state in which the chemical remains in the interior space of the tank, when the residual amount detected by the sensor reaches a first preset amount or less.
5 more elements
Dependencies are inferred from the claim text.