Method and machine for examining wafers
AssigneeASML Netherlands B.V.
InventorsChien-Hung CHOU, Wen-Tin TAI
Life of this patent
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Abstract
Method and machine utilizes the real-time recipe to perform weak point inspection on a series of wafers during the fabrication of integrated circuits. Each real-time recipe essentially corresponds to a practical fabrication history of a wafer to be examined and/or the examination results of at least one examined wafer of same “lot”. Therefore, different wafers can be examined by using different recipes where each recipe corresponds to a specific condition of a wafer to be examined, even these wafers are received by a machine for examining at the same time.
Claims22
1-10. (canceled)
An apparatus for inspecting a sample, the apparatus comprising:
- a memory storing a set of instructions;
- and
- a processor configured to execute the set of instructions to cause the apparatus to:
- determine a similarity between a map representing the sample and a reference;
- determine a first inspecting plan for inspecting the sample according to a critical area to define an inspection area on the sample when a first condition is satisfied that is based on the similarity, wherein the first inspecting plan covers only a defect inspection area indicated by the map;
- acquire at least one image of the sample with a high resolution imaging tool using the first inspecting plan;
- and
- identify defects in the inspection area according to the at least one image.
A method of inspecting a sample, comprising:
- determining a similarity between a map representing the sample and a reference;
- determining a first inspecting plan according to a critical area to define an inspection area on the sample when a first condition is satisfied that is based on the similarity, wherein the first inspecting plan covers only a defect inspection area indicated by the map;
- examining the sample with a high resolution imaging tool using the first inspecting plan;
- and
- identifying defects in the inspection area according to at least one image taken by the high resolution imaging tool.
A non-transitory computer readable medium that stores a set of instructions that is executable by at least one processor of an apparatus to cause the apparatus to perform a method for inspecting a sample, the method comprising:
- determining a similarity between a map representing the sample and a reference;
- determining a first inspecting plan according to a critical area to define an inspection area on the sample when a first condition is satisfied that is based on the similarity, wherein the first inspecting plan covers only a defect inspection area indicated by the map;
- examining the sample with a high resolution imaging tool using the first inspecting plan;
- and
- identifying defects in the inspection area according to at least one image taken by the high resolution imaging tool.
Dependencies are inferred from the claim text.