Metrology system and method for measuring an excitation laser beam in an euv plasma source
AssigneeCarl Zeiss SMT GmbH
InventorsMatthias Manger, Florian Baumer
Life of this patent
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Abstract
A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled from the excitation laser beam after a reflection on the target material. Each of the first beam analysis system and the second beam analysis system has at least one wavefront sensor system.
Claims20
A metrology system configured to be used with an EUV plasma source in which an excitation laser beam is guided to a target material in a plasma ignition position, the metrology system comprising:
- a first beam analysis system configured to analyze a first measurement beam coupled from the excitation laser beam before the excitation laser beam interacts with the target material;
- and
- a second beam analysis system configured to analyze a second measurement beam coupled from the excitation laser beam after the excitation laser beam interacts with the target material,
- wherein:
- the first beam analysis system comprises a first wavefront sensor system;
- and
- the second beam analysis system comprises a second wavefront sensor system.
The metrology system of claim 12, wherein the second grating shearing interferometer comprises a second far field grating shearing interferometer.
A system, comprising:
- an EUV plasma source configured to guide an excitation laser beam to a target material in a plasma ignition position;
- and
- a metrology system comprising:
- a first beam analysis system configured to analyze a first measurement beam coupled from an excitation laser beam before the excitation laser beam interacts with the target material;
- and
- a second beam analysis system configured to analyze a second measurement beam coupled from the excitation laser beam after the excitation laser beam interacts with the target material,
- wherein:
- the first beam analysis system comprises a first wavefront sensor system;
- and
- the second beam analysis system comprises a second wavefront sensor system.
A method, comprising:
- guiding an excitation laser beam in an EUV plasma source to a target material in a plasma ignition;
- using a first beam analysis system to analyze a first measurement beam coupled from the excitation laser beam before the excitation laser beam interacts with the target material;
- and
- using a second beam analysis system to analyze a second measurement beam coupled from the excitation laser beam after the excitation laser beam interacts with the target material,
- wherein:
- to the first beam analysis system comprises a first wavefront sensor system;
- and
- the second beam analysis system comprises a second wavefront sensor system.
Dependencies are inferred from the claim text.