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US 2021/0172050 A1Published application
Sputtering target, method for producing laminated film, laminated film and magnetic recording medium
AssigneeJX Nippon Mining & Metals Corporation
InventorsMasayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda
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Abstract
A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
Claims13
A sputtering target containing Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
A laminated film, comprising:
- a base layer containing Ru;
- and a magnetic layer directly formed on the base layer or indirectly formed on the base layer via an intermediate layer containing Co and at least one metal selected from the group consisting of Cr and Ru as a metal component, the magnetic layer containing Co and Pt as metal components and having a molar ratio of a content of Pt to a content of Co of from 5/100 to 45/100;
- wherein the magnetic layer contains Nb2O5 as a metal oxide component.
Dependencies are inferred from the claim text.