Substrate processing apparatus

A substrate processing apparatus configured to process a substrate by supplying a process gas, the substrate processing apparatus comprising:

• a process vessel provided with a plurality of process regions in which the substrate is processed;
• a rotary table provided in the process vessel to be rotatable about a point outside the substrate so as to enable the substrate to sequentially pass through the plurality of the process regions, the substrate being placed on the rotary table;
• and
• a gas supply nozzle comprising:
• a forward path portion provided in at least one of the plurality of the process regions and extending from a wall of the process vessel toward a center portion of the rotary table to face a surface of the rotary table;
• and
• a return path portion connected with the forward path portion via a bent portion and extending from the center portion of the rotary table toward the wall of the process vessel to face the surface of the rotary table,
• wherein a downstream end of the forward path portion of the gas supply nozzle extends beyond an edge of a concave portion in which the substrate sits, and a front end of the return path portion extends to an exhaust groove outside the rotary table.