Imprint apparatus and method of controlling imprint apparatus

An imprint apparatus, including:

• a substrate stage configured to move a substrate;
• an ejection unit including a plurality of nozzles and configured to eject an ejection material from the nozzles onto the substrate in synchronization with movement of the substrate stage;
• and
• an imprint unit configured to press down a mold in which a pattern is formed onto the substrate on which the ejection material is ejected, wherein the imprint apparatus comprising:
• a determination unit configured to determine a relative ejection timing of an abnormal nozzle with respect to a normal nozzle based on ejection properties of the nozzles and a moving direction of the substrate stage and determine an ejection timing of the normal nozzle based on the determined relative ejection timing;
• and
• a control unit configured to control a synchronization timing of the substrate stage and the ejection unit based on the ejection timing of the normal nozzle determined by the determination unit.