Compositions and Methods of Additive Manufacturing of Polishing Pads
AssigneeApplied Materials, Inc.
InventorsAtul Bhaskar Chaudhari, Sivapackia Ganapathiappan, Srobona Sen
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Abstract
A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.
Claims23
A formulation for three dimensional (3D) printing of a polishing layer of a polishing pad, the formulation comprising:
- a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol;
- monomer;
- an additive;
- and
- a photoinitiator, wherein a viscosity of the formulation is applicable for 3D printing of the polishing layer.
A formulation for three dimensional (3D) printing of a polishing layer of a polishing pad, the formulation comprising:
- a urethane acrylate oligomer incorporating a difunctional polyol or difunctional polythiol;
- multiple monomers;
- an additive;
- and
- a photoinitiator, wherein the formulation comprises a viscosity applicable for 3D printing of the polishing layer.
A method of fabricating a polishing pad, comprising:
- injecting a formulation comprising a urethane acrylate oligomer through a nozzle to form a polishing layer of the polishing pad, wherein the urethane acrylate oligomer comprises a urethane oligomer end-capped with an acrylate, the urethane oligomer based on a difunctional polyol and a difunctional isocyanate or based on a difunctional polythiol and the difunctional isocyanate;
- and
- applying light to the formulation to cure the urethane acrylate oligomer as injected, wherein the difunctional polyol or the difunctional polythiol are selected to affect a property of the polishing layer.
Dependencies are inferred from the claim text.