Method for producing vapor deposition mask, and method for producing organic semiconductor element
AssigneeDai Nippon Printing Co., Ltd.
InventorsToshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA
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AssigneeDai Nippon Printing Co., Ltd.
InventorsToshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA
Estimating the term…
A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.
A method for producing a vapor deposition mask that is formed by a resin mask having openings corresponding to a pattern to be produced by vapor deposition, comprising the step of:
Dependencies are inferred from the claim text.