Substrate support with real time force and film stress control
AssigneeApplied Materials, Inc.
InventorsWendell Glenn BOYD, JR., Govinda RAJ, Matthew James BUSCHE
Life of this patent
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Abstract
Embodiments disclosed herein include a substrate support having a sensor assembly, and processing chamber having the same. In one embodiment, a substrate support has a puck. The puck has a workpiece support surface and a gas hole exiting the workpiece support surface. A sensor assembly is disposed in the gas hole and configured to detect a metric indicative of a deflection of a workpiece disposed on the workpiece support surface, wherein the sensor assembly is configured to allow gas to flow past the sensor assembly when positioned in the gas hole.
Claims20
A sensor assembly, comprising:
- a sensor configured to detect a metric indicative of a deflection of a workpiece disposed above the sensor;
- and
- a porous sensor housing, the sensor disposed in the porous sensor housing, the porous sensor housing comprising:
- a split plate having a central opening with an inner perimeter disposed around the sensor;
- and
- a mounting head disposed below the split plate.
A processing chamber comprising:
- a chamber body enclosing a chamber interior volume;
- and
- a substrate support disposed in the chamber interior volume, the substrate support comprising:
- a puck, the puck comprising:
- a workpiece support surface;
- a gas hole formed through the workpiece support surface;
- and
- a sensor assembly disposed in the gas hole;
- a transition conduit fluidly coupled to the gas hole;
- a connection coupled to the transition conduit wherein the connection comprising:
- a first opening fluidly coupled to the transition conduit;
- and
- a second opening coupled to a control system wherein the control system is coupled to the sensor assembly.
Dependencies are inferred from the claim text.