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US 2021/0063883 A1Published application
Substrate processing apparatus, substrate processing method, and storage medium
AssigneeTokyo Electron Limited
InventorKeiichi TANAKA
Life of this patent
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Abstract
A substrate processing apparatus includes a holder configured to hold, within a processing container, a substrate having a pattern formed of a resist material for EUV lithography on a surface thereof, a rotation driving part configured to rotate the holder, and a light source part including a plurality of light sources configured to emit light to the surface of the substrate held by the holder rotated by the rotation driving part such that a number of rotations of the substrate is 0.5 rpm to 3 rpm.
Claims7
A substrate processing apparatus comprising:
- a holder configured to hold, within a processing container, a substrate having a pattern formed of a resist material for EUV lithography on a surface of the substrate;
- a rotation driving part configured to rotate the holder;
- and
- a light source part including a plurality of light sources configured to emit light to the surface of the substrate held by the holder that is rotated by the rotation driving part such that a number of rotations of the substrate is 0.5 rpm to 3 rpm.
1 more element
A substrate processing method comprising:
- emitting light including vacuum ultraviolet light from a light source part including a plurality of light sources to a surface of a substrate on which a pattern is formed of a resist material for EUV lithography in a processing container while rotating the substrate such that a number of rotations of the substrate is 0.5 rpm to 3 rpm.
Dependencies are inferred from the claim text.