Composition for forming silica layer and silica layer
AssigneeSamsung SDI Co., Ltd.
InventorsJin-Hee BAE, Taeksoo KWAK, Myungho KANG, Seungwoo JANG, Kunbae NOH
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Abstract
Provided are a composition for forming a silica layer including a silicon-containing polymer and a solvent, wherein when adding 70 g of the composition for forming the silica layer to a 100 ml container, leaving it at 40° C. for 28 days, and taking 1 ml of gas generated from the composition, 1 ml of the gas includes hydrogen gas (H2), silane gas (SiH4), and ammonia gas (NH3), and the hydrogen gas, silane gas, and ammonia gas satisfy Equation 1: [(hydrogen gas amount (ppm))/(silane gas amount (ppm)+ammonia gas amount (ppm))≥1.5], a silica layer manufactured therefrom, and an electronic device including the silica layer.
Claims18
A composition for forming a silica layer, the composition comprising:
- a silicon-containing polymer;
- and
- a solvent,
- wherein when adding 70 g of the composition to a 100 ml container, sealing the container, leaving the sealed container at 40° C. for 28 days, and then taking a 1 ml sample of gas from the sealed container, the 1 ml sample of the gas comprises hydrogen gas (H2), silane gas (SiH4), and ammonia gas (NH3), and the hydrogen gas, the silane gas, and the ammonia gas satisfy Equation 1:
- (hydrogen gas amount (ppm))/(silane gas amount (ppm)+ammonia gas amount (ppm))≥1.5. [Equation 1]
Dependencies are inferred from the claim text.