# US 2020/0402818 A1 · Unit for supplying liquid, apparatus and method for treating substrate having the unit

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- Number: US 2020/0402818 A1
- Document ID: US20200402818A1
- Status: Published application
- Kind: A1
- Application number: 16/906,392
- Filed: 2020-06-19
- Published: 2020-12-24
- Earliest claimed: 2019-06-24
- Assignees: Semes Co., Ltd.
- Applicants: Semes Co., Ltd.
- Inventors: Seong Soo LEE; Buyoung JUNG; Gi Hun CHOI; Myung A JEON; Soo Young PARK
- Web page: https://patentgrep.com/patent/US20200402818A1

## CPC

- H10P 72/0414: {using mainly spraying means, e.g. nozzles}
- H10P 72/0448: {Apparatus for applying a liquid, a resin, an ink or the like}
- H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)}
- H10P 72/0462: {characterised by the construction of the processing chambers, e.g. modular processing chambers}
- H10P 72/0604: {Process monitoring, e.g. flow or thickness monitoring}
- H10P 72/127: {characterised by the substrate support}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

An apparatus and a method for performing liquid treatment for a substrate are provided. The apparatus for treating the substrate includes a treating container having a treatment space inside the treating container, a substrate support unit to support a substrate in the treatment space, and a liquid supply unit to supply treatment liquid to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle, a supply line to supply the treatment liquid to the nozzle and having a first valve mounted in the supply line, and a discharge line branching from a branch point which is a point downstream of the first valve in the supply line to discharge the treatment liquid from the supply line, and having a second valve mounted in the discharge line. A valve is absent in an area between the branch point and the nozzle, in the supply line.

## Claims

### Claim 1

An apparatus for treating a substrate, the apparatus comprising:
a treating container having a treatment space inside the treating container;
a substrate support unit configured to support a substrate in the treatment space; and
a liquid supply unit configured to supply treatment liquid to the substrate supported by the substrate support unit,
wherein the liquid supply unit includes:
a nozzle;
a supply line configured to supply the treatment liquid to the nozzle and having a first valve mounted in the supply line; and
a discharge line branching from a branch point which is a point downstream of the first valve in the supply line to discharge the treatment liquid from the supply line, and having a second valve mounted in the discharge line, and
wherein a valve is absent in an area between the branch point and the nozzle, in the supply line.

### Claim 2 (depends on 1)

The apparatus of claim 1, wherein an end of a downstream area of the supply line based on the branch point is positioned higher than the discharge line.

### Claim 3 (depends on 2)

The apparatus of claim 2, wherein the end of the downstream area is positioned higher than the branch point.

### Claim 4 (depends on 3)

The apparatus of claim 3, wherein an area of the downstream area, which extends from the branch point in a downstream direction, has a curved shape.

### Claim 5 (depends on 4)

The apparatus of claim 4, wherein the downstream direction is downward provided in an upstream area of the supply line based on the branch point, and
wherein the curved shape is provided in a convex-upward shape.

### Claim 6 (depends on 5)

The apparatus of claim 5, wherein the liquid supply unit further includes:
a first sensor configured to sense a first water level of the treatment liquid in the downstream area,
wherein the downstream area includes:
a first part extending from the branch point and having the curved shape;
a second part extending from the first part and provided at a position in a line with a position of the first part or lower than the position of the first part; and
a third part extending from the second part, positioned higher than the first part, and including the end, and
wherein the first sensor is installed in the third part.

### Claim 7 (depends on 6)

The apparatus of claim 6, wherein the liquid supply unit further includes:
a buffer mounted downstream of the second valve in the discharge line and configured to store temporarily the treatment liquid in the buffer.

### Claim 8 (depends on 7)

The apparatus of claim 7, wherein the buffer includes:
a housing mounted in the discharge line and having a buffer space in the housing; and
a second sensor configured to sense a second water level of the treatment liquid filled in the buffer space.

### Claim 9 (depends on 6)

The apparatus of claim 6, wherein the liquid supply unit further includes:
a pump configured to apply flow pressure to the treatment liquid flowing along the supply line; and
a controller configured to adjust supply of the treatment liquid to the nozzle, and
wherein the controller controls the second valve such that the second valve is cut off in a supply mode to supply the treatment liquid to the nozzle, and open in a standby mode to stop the supply of the treatment liquid to the nozzle.

### Claim 10 (depends on 9)

The apparatus of claim 9, wherein the controller cuts off the first valve and the second valve, when receiving a sensing signal for the treatment liquid from the first sensor or the second sensor in the standby mode.

### Claim 11 (depends on 9)

The apparatus of claim 9, wherein the controller adjusts the pump such that the treatment liquid is filled in the second part in the standby mode.

### Claim 12

A liquid supply unit comprising:
a nozzle;
a supply line configured to supply treatment liquid to the nozzle and having a first valve mounted in the supply line; and
a discharge line branching from a branch point which is a point downstream of a first valve in the supply line to discharge the treatment liquid from the supply line, and having a second valve mounted in the discharge line,
wherein a valve is absent in an area between the branch point and the nozzle, in the supply line.

### Claim 13 (depends on 12)

The liquid supply unit of claim 12, wherein an end of a downstream area of the supply line based on the branch point is positioned higher than the branch point and the discharge line.

### Claim 14 (depends on 13)

The liquid supply unit of claim 13, wherein an area of the downstream area, which extends from the branch point in a downstream direction, has a curved shape.

### Claim 15 (depends on 14)

The liquid supply unit of claim 14, wherein the downstream direction is downward provided in an upstream area of the supply line based on the branch point, and
wherein the curved shape is provided in a convex-upward shape.

### Claim 16 (depends on 15)

The liquid supply unit of claim 15, wherein the liquid supply unit further includes:
a first sensor configured to sense a first water level of the treatment liquid in the downstream area,
wherein the downstream area includes:
a first part extending from the branch point and having the curved shape;
a second part extending from the first part and provided at a position in a line with a position of the first part or lower than the position of the first part; and
a third part extending from the second part, positioned higher than the first part, and including the end, and
wherein the first sensor is installed in the third part.

### Claim 17 (depends on 16)

The liquid supply unit of claim 16, wherein the liquid supply unit further includes:
a buffer mounted downstream of the second valve in the discharge line and configured to store temporarily the treatment liquid in the buffer, and
wherein the buffer includes:
a housing mounted in the discharge line and having a buffer space in the housing; and
a second sensor configured to sense a second water level of the treatment liquid filled in the buffer space.

### Claim 18 (depends on 12)

The liquid supply unit of claim 12, wherein the liquid supply unit further includes:
a controller configured to adjust supply of the treatment liquid to the nozzle, and
wherein the controller controls the second valve such that the second valve is cut off in a supply mode to supply the treatment liquid to the nozzle, and open in a standby mode to stop the supply of the treatment liquid to the nozzle.

### Claim 19

(canceled)

### Claim 20

(canceled)