# US 2020/0401057 A1 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2020/0401057 A1 - Document ID: US20200401057A1 - Status: Published application - Kind: A1 - Application number: 17/012,657 - Filed: 2020-09-04 - Published: 2020-12-24 - Earliest claimed: 2005-11-16 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Martinus Hendrikus Antonius LEENDERS; Nicolaas Rudolf Kemper; Joost Jeroen Ottens - Web page: https://patentgrep.com/patent/US20200401057A1 ## CPC - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F 7/70866: {of mask or workpiece} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased. ## Claims ### Claim 1 A lithographic apparatus, comprising: a projection system; a table configured to hold a substrate to be imaged by the projection system; and a liquid supply system configured to provide a space between the projection system and the substrate with liquid, at least a part of the liquid supply system being moveable relative to and independent of the projection system and the substrate in at least one direction which is substantially parallel to a top surface of the substrate. ### Claim 2 (depends on 1) The apparatus of claim 1, further comprising an actuator configured to move the at least a part of the liquid supply system in the at least one direction and wherein, in use, a meniscus of the liquid extends between the substrate and the at least a part of the liquid supply system. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the liquid supply system comprises a gas knife configured to seal between the liquid supply system and substrate to at least partly contain liquid in the space. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the liquid supply system is configured to provide liquid to an area of the substrate which is, in plan, smaller than a top surface of the substrate. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein, in use, movement of the at least a part of the liquid supply system in the at least one direction is effective to move a volume, to which the at least a part of the liquid supply system provides liquid, in the at least one direction. ### Claim 6 (depends on 1) The apparatus of claim 1, further comprising a substrate table configured to hold the substrate and move it relative to the projection system independent of movement of the at least a part of the liquid supply system. ### Claim 7 (depends on 1) The apparatus of claim 1, further comprising a positional controller configured to control movement of the at least a part of the liquid supply system such that, during a portion of movement of the substrate relative to the projection system during imaging, the at least a part of the liquid supply system is moved to reduce relative velocity between the at least a part of the liquid supply system and the substrate, while maintaining the space between the projection system and the substrate substantially full of liquid. ### Claim 8 (depends on 7) The apparatus of claim 7, wherein the positional controller is configured to control movement of the at least a part of the liquid supply system, during a scanning of the substrate under the projection system in a scanning direction, with a major component in the scanning direction and a minor component in a direction substantially orthogonal to the scanning direction, such that the at least a part of the liquid supply system moves during the scan from a position to one side of the projection system to a position toward the other side of the projection system in a direction substantially orthogonal to the scanning direction. ### Claim 9 (depends on 7) The apparatus of claim 7, wherein the positional controller is configured to control movement of the at least a part of the liquid supply system, during a step motion of the substrate under the projection system in a step direction, in the step direction. ### Claim 10 (depends on 1) The apparatus of claim 1, wherein the at least a part of the liquid supply system is configured to form a contactless seal between the liquid supply system and the substrate. ### Claim 11 (depends on 10) The apparatus of claim 10, wherein the at least a part of the liquid supply system comprises a barrier member configured to surround the space and provide a physical barrier to liquid escaping radially outwardly from an optical axis of the apparatus from the space and wherein, in use, the contactless seal is provided between the barrier member and the substrate. ### Claim 12 (depends on 10) The apparatus of claim 10, wherein, in use, the contactless seal at least partly relies on a meniscus force of the liquid. ### Claim 13 (depends on 1) The apparatus of claim 1, further comprising a first actuator configured to move the at least a part of the liquid supply system in a second direction substantially orthogonal to the at least one direction and further comprising a second actuator configured to move the at least a part of the liquid supply system in the at least one direction and wherein the stroke of the second actuator is at least 1½ times the stroke of the first actuator. ### Claim 14 (depends on 1) The apparatus of claim 1, wherein the at least a part of the liquid supply system comprises a plate. ### Claim 15 (depends on 1) The apparatus of claim 1, wherein the at least a part of the liquid supply system comprises a liquid supply part of the liquid supply system. ### Claim 16 (depends on 1) The apparatus of claim 1, further comprising a force decoupling member, positioned around the projection system and, in use, in the liquid, to at least reduce transfer of forces from the part of the liquid supply system to the projection system through the liquid, and wherein, in use, the force decoupling member is dynamically decoupled from the projection system and/or the force decoupling member is attached to a frame to which the projection system is attached or attached to a frame configured to support the substrate. ### Claim 17 A lithographic apparatus, comprising: a projection system; a table configured to hold a substrate to be imaged by the projection system; and a liquid supply system comprising a barrier member, surrounding the projection system, configured to at least partly contain liquid in a volume including a space between the projection system and the substrate, wherein the barrier member is configured to be moveable independently of the substrate in a first direction in a plane substantially parallel to a top surface of the substrate, and wherein the barrier member is sized and shaped such that it is moveable in the first direction by at least a distance equal to a slit height of the lithographic apparatus. ### Claim 18 (depends on 17) The apparatus of claim 17, wherein the barrier member is sized and shaped such that it is moveable in a second direction substantially orthogonal to the first direction and in a plane substantially parallel to the top surface of the substrate by at least a distance equal to the slit height of the lithographic apparatus. ### Claim 19 (depends on 17) The apparatus of claim 17, wherein the barrier member is sized and shaped such that it is moveable by more distance in the first direction than it is moveable in a second direction. ### Claim 20 (depends on 17) The apparatus of claim 17, wherein the barrier member is sized and shaped such that it is moveable in the first direction by a distance of at least 20% of a maximum scan length of the lithographic apparatus or wherein the barrier member is sized and shaped such that it is moveable in a second direction by a distance of at least 20% of the slit width of the lithographic apparatus.