# US 2020/0401055 A1 · Conformal stage > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2020/0401055 A1 - Document ID: US20200401055A1 - Status: Published application - Kind: A1 - Application number: 16/956,617 - Filed: 2018-12-21 - Published: 2020-12-24 - Earliest claimed: 2017-12-28 - Assignees: Onto Innovation Inc. - Applicants: Onto Innovation, Inc. - Inventors: J. Casey DONAHER; Edward J. FICARRA; Christopher J. MCLAUGHLIN - Web page: https://patentgrep.com/patent/US20200401055A1 ## CPC - G03F 7/707: {Chucks, e.g. chucking or un-chucking operations or structural details} - G03F 7/70716: {Stages} - G03F 7/70708: {being electrostatic; Electrostatically deformable vacuum chucks} - H10P 72/57: {Mask-wafer alignment} - H10P 72/70: for supporting or gripping - H10P 72/72: using electrostatic chucks - H10P 72/722: {Details of electrostatic chucks} - H10P 72/76: using mechanical means, e.g. clamps or pinches - G03F 7/703: {Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base relative to a device for processing a substrate. The chuck conforms to a geometry of the base while moving relative to the base. ## Claims ### Claim 1 A stage for supporting a substrate comprising: a base positioned below an optical system, the base being characterized by a surface having a flatness and a size that is at least a size of a field of view of the optical system; and, a chuck that substantially conforms to the surface of the base, so that the chuck has the flatness of the base to allow for substrate processing. ### Claim 2 (depends on 1) The stage for supporting a substrate of claim 1, wherein the flatness has deviations that are less than 1 millimeter over 1 meter. ### Claim 3 (depends on 1) The stage for supporting a substrate of claim 1, wherein the flatness is over a subregion of the base. ### Claim 4 (depends on 3) The stage for supporting a substrate of claim 3, wherein the subregion is proud of a surrounding surface of the base. ### Claim 5 (depends on 3) The stage for supporting a substrate of claim 3, wherein the subregion is below a surrounding surface of the base. ### Claim at position 6 6-13. (canceled) ### Claim 14 (depends on 1) The stage for supporting a substrate of claim 1, wherein an upper surface of the chuck is provided with means for securing a substrate thereto in close conformity with the chuck. ### Claim at position 8 15-40. (canceled) ### Claim 41 (depends on 1) The stage for supporting a substrate of claim 1, wherein the flatness is at least within 2 microns over 200 mm. ### Claim 42 (depends on 1) The stage for supporting a substrate of claim 1, wherein the base is comprised of at least one monolith with an upper surface of a tile. ### Claim 43 (depends on 1) The stage for supporting a substrate of claim 1, wherein the base is comprised of at least one monolith with an upper surface of epoxy. ### Claim 44 (depends on 1) The stage for supporting a substrate of claim 1, wherein the chuck conforms to a geometry of the base while moving relative to the base. ### Claim 45 (depends on 1) The stage for supporting a substrate of claim 1, wherein the optical system is a projection camera that provides lithographic exposure of the substrate. ### Claim 46 (depends on 1) The stage for supporting a substrate of claim 1, wherein the substrate processing includes inspection, which is performed by an optical inspection device. ### Claim 47 A stage for supporting a substrate comprising: a means for supporting a chuck positioned below an optics, the means being characterized by a surface having a flatness and a size that is at least a size of a field of view of the optics; and, a chuck that substantially conforms to the surface of the means, so that the chuck has the flatness of the means to allow for substrate processing. ### Claim 48 (depends on 47) The stage for supporting a substrate of claim 47, wherein the flatness has deviations that are less than 1 millimeter over 1 meter. ### Claim 49 (depends on 47) The stage for supporting a substrate of claim 47, wherein the flatness is at least within 2 microns over 200 mm. ### Claim 50 (depends on 1) The stage for supporting a substrate of claim 1, wherein the optics is a projection camera that provides lithographic exposure of the substrate. ### Claim 51 A method for supporting a chuck with a flatness over a base comprising: conforming the chuck to the base with the flatness and a size that is at least a size of a field of view of a projection camera; moving the chuck relative to the base to process different parts of a substrate; and processing the substrate over the base that provides the flatness for the processing. ### Claim 52 (depends on 51) The method of claim 51, wherein the flatness has deviations that are less than 1 millimeter over 1 meter. ### Claim 53 (depends on 51) The method of claim 51, wherein the flatness is at least within 2 microns over 200 mm. ### Claim 54 (depends on 51) The method of claim 51, wherein the base is comprised of at least one monolith with an upper surface of epoxy.