# US 2020/0401048 A1 · Digital masking system, pattern imaging apparatus and digital masking method

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- Number: US 2020/0401048 A1
- Document ID: US20200401048A1
- Status: Published application
- Kind: A1
- Application number: 17/012,556
- Filed: 2020-09-04
- Published: 2020-12-24
- Earliest claimed: 2017-11-02
- Assignees: Jabil Inc.
- Applicants: Jabil Inc.
- Inventors: Scott Klimczak; Nicholas Diaco
- Web page: https://patentgrep.com/patent/US20200401048A1

## CPC

- G03F 7/2051: {Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source (G03F7/70 takes precedence)}
- B29C 64/277: using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED]
- B33Y 30/00: Apparatus for additive manufacturing; Details thereof or accessories therefor
- G02B 27/1026: {for use with reflective spatial light modulators}
- G02B 27/1046: {for use with transmissive spatial light modulators}
- G02B 27/106: {for splitting or combining a plurality of identical beams or images, e.g. image replication}
- G02B 27/1066: {for enhancing image performance, like resolution, pixel numbers, dual magnifications or dynamic range, by tiling, slicing or overlapping fields of view}
- G02B 27/141: {using dichroic mirrors}
- G02B 27/145: {having sequential partially reflecting surfaces}
- G02B 27/149: {using crossed beamsplitting surfaces, e.g. cross-dichroic cubes or X-cubes}
- G03F 7/0037: {Production of three-dimensional images}
- G03F 7/70058: {Mask illumination systems}
- G03F 7/70275: {Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems}
- G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices}
- G03F 7/70416: {2.5D lithography}
- H04N 9/12: Picture reproducers (H04N9/11 takes precedence)
- H04N 9/3164: {using multiple light sources}
- G02B 26/0833: {the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B)}
- G02B 26/105: {with one or more pivoting mirrors or galvano-mirrors (G02B26/101 takes precedence)}
- G03F 7/70: {Microphotolithographic exposure; Apparatus therefor (photo-masks G03F1/00)}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- B33Y: ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- H04N: PICTORIAL COMMUNICATION, e.g. TELEVISION

## Abstract

A digital masking system includes a supporting structure for supporting a material, and a pattern imaging apparatus. The pattern imaging apparatus includes a light source device, multiple imaging devices that convert light from the light source device into a plurality of light beams each representing an image, and a combiner that combines the light beams into a single light beam which is projected toward a material.

## Claims

### Claim 1

A digital masking method, comprising:
providing a plurality of light components;
receiving and converting the light components into a plurality of light beams each representing an image;
receiving and combining the light beams into a single light beam output; and
projecting the single light beam output toward a material.

### Claim 2 (depends on 1)

The digital masking method of claim 1, wherein each of the imaging devices has a maximum power input limit.

### Claim 3 (depends on 2)

The digital masking method of claim 2, wherein power of each of the light components is smaller than or equal to the maximum power input limit.

### Claim 4 (depends on 3)

The digital masking method of claim 3, wherein a sum of the power of the light components is greater than the maximum power input limit.

### Claim 5 (depends on 2)

The digital masking method of claim 2, wherein the light components have substantially the same wavelength spectrum.

### Claim 6 (depends on 2)

The digital masking method of claim 2, wherein at least two of the light components have substantially different wavelength spectrums.

### Claim 7 (depends on 1)

The digital masking method of claim 1, wherein the images represented by the light beams are identical, and the images represented by the light beams that are combined into the single light beam output completely overlap each other on the material.

### Claim 8 (depends on 1)

The digital masking method of claim 1, wherein at least some of the images represented by the light beams overlap each other except for edge portions thereof on the material.

### Claim 9 (depends on 1)

The digital masking method of claim 1, wherein the light components have substantially the same wavelength spectrum.

### Claim 10 (depends on 1)

The digital masking method of claim 1, wherein at least two of the light components have substantially different wavelength spectrums.