# US 2020/0401047 A1 · Underlayer film-forming composition, pattern-forming method, copolymer, and monomer for underlayer film-forming composition

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- Number: US 2020/0401047 A1
- Document ID: US20200401047A1
- Status: Published application
- Kind: A1
- Application number: 16/975,565
- Filed: 2019-02-25
- Published: 2020-12-24
- Earliest claimed: 2018-02-26
- Assignees: Oji Holdings Corporation
- Applicants: Oji Holdings Corporation
- Inventors: Kimiko HATTORI; Kazuyo MORITA
- Web page: https://patentgrep.com/patent/US20200401047A1

## CPC

- C08B 37/0057: {beta-D-Xylans, i.e. xylosaccharide, e.g. arabinoxylan, arabinofuronan, pentosans; (beta-1,3)(beta-1,4)-D-Xylans, e.g. rhodymenans; Hemicellulose; Derivatives thereof}
- G03F 7/11: having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)}
- C08F 220/62: Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof (copolymers of drying oils C08F242/00)
- C08L 1/02: Cellulose; Modified cellulose
- C08L 5/14: Hemicellulose; Derivatives thereof
- C08L 33/08: Homopolymers or copolymers of acrylic acid esters
- G03F 7/0047: {characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing}
- G03F 7/091: {characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement}
- C08F 220/28: containing no aromatic rings in the alcohol moiety
- C08B: POLYSACCHARIDES; DERIVATIVES THEREOF (polysaccharides containing less than six saccharide radicals attached to each other by glycosidic linkages C07H; fermentation or enzyme-using processes C12P19/00; sugar industry C13; production of cellulose D21)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08L: COMPOSITIONS OF MACROMOLECULAR COMPOUNDS (compositions based on polymerisable monomers C08F, C08G; artificial filaments or fibres D01F; textile treating compositions D06)

## Abstract

An object of the present invention is to provide an underlayer film-forming composition capable of forming an underlayer film which remains with a high proportion in an organic solvent, has a low UV reflectivity, and is excellent in etching resistance. The present invention relates to an underlayer film-forming composition, which contains a copolymer and an organic solvent and is used for patterning, wherein the copolymer contains: (a) a unit derived from a sugar derivative; (b) a unit derived from a compound having a light antireflection function; and (c) a unit derived from a compound capable of cross-coupling the copolymer, the unit derived from a sugar derivative (a) is at least one selected from a unit derived from a pentose derivative and a unit derived from a hexose derivative, and the underlayer film-forming composition is used for metal introduction.

## Claims

### Claim 1

An underlayer film-forming composition, which contains a copolymer and an organic solvent and is used for patterning,
wherein the copolymer contains:
(a) a unit derived from a sugar derivative;
(b) a unit derived from a compound having a light antireflection function; and
(c) a unit derived from a compound capable of cross-coupling the copolymer,
the unit derived from a sugar derivative (a) is at least one selected from a unit derived from a pentose derivative and a unit derived from a hexose derivative, and
the underlayer film-forming composition is for metal introduction.

### Claim 2 (depends on 1)

The underlayer film-forming composition according to claim 1, wherein the unit derived from a compound having a light antireflection function (b) is a unit derived from an aromatic ring-containing compound, and the unit derived from a compound capable of cross-coupling the copolymer (c) is a unit derived from a (meth)acrylate.

### Claim 3 (depends on 1)

The underlayer film-forming composition according to claim 1, wherein the unit derived from a sugar derivative (a) is at least one selected from a unit derived from a cellulose derivative, a unit derived from a hemicellulose derivative, and a unit derived from a xylooligosaccharide derivative.

### Claim 4 (depends on 2)

The underlayer film-forming composition according to claim 2, wherein the unit derived from an aromatic ring-containing compound is at least one selected from a unit derived from a benzene ring-containing compound and a unit derived from a naphthalene ring-containing compound.

### Claim 5 (depends on 2)

The underlayer film-forming composition according to claim 2, wherein the unit derived from a (meth)acrylate has at least one selected from an alkyl group which may have a substituent and an aryl group which may have a substituent.

### Claim 6 (depends on 2)

The underlayer film-forming composition according to claim 2, wherein the unit derived from a (meth)acrylate has an alkyl group which may have a substituent, and the alkyl group has 1 to 8 carbon atoms.

### Claim 7 (depends on 1)

A pattern-forming method, comprising:
forming an underlayer film using the underlayer film-forming composition according to claim 1.

### Claim 8 (depends on 7)

The pattern-forming method according to claim 7, comprising:
introducing a metal into the underlayer film.

### Claim 9

A copolymer containing: (a) a unit derived from a sugar derivative;
(b) a unit derived from a compound having a light antireflection function; and
(c) a unit derived from a compound capable of cross-coupling the copolymer,
wherein the unit derived from a sugar derivative (a) is at least one selected from a unit derived from a pentose derivative and a unit derived from a hexose derivative.

### Claim 10 (depends on 9)

The copolymer according to claim 9, wherein the unit derived from a compound having a light antireflection function (b) is a unit derived from an aromatic ring-containing compound, and the unit derived from a compound capable of cross-coupling the copolymer (c) is a unit derived from a (meth)acrylate.

### Claim 11

A monomer for an underlayer film-forming composition, which is represented by the following formula (1′) or the following formula (2′):
wherein, in formula (1′), each R1 independently represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, and a plurality of R1 may be the same or different;
R′ represents a hydrogen atom, —OR11, or —NR122;
R″ represents a hydrogen atom, —OR11, —COOR13, or —CH2OR13, provided that R11 represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, R12 represents a hydrogen atom, an alkyl group, a carboxyl group, or an acyl group, a plurality of R12 may be the same or different, and R13 represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group;
R5 represents a hydrogen atom or an alkyl group; and
each Y1 independently represent a single bond or a linking group;
wherein, in formula (2′), each R201 independently represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, and a plurality of R201 may be the same or different;
R′ represents a hydrogen atom, —OR11, or —NR122; and
R″ represents a hydrogen atom, —OR11, —COOR13, or —CH2OR13, provided that R11 represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, R12 represents a hydrogen atom, an alkyl group, a carboxyl group, or an acyl group, a plurality of R12 may be the same or different, and R13 represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group.