# US 2020/0401039 A1 · Pellicle, exposure master, exposure device and method for manufacturing semiconductor device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2020/0401039 A1 - Document ID: US20200401039A1 - Status: Published application - Kind: A1 - Application number: 17/010,929 - Filed: 2020-09-03 - Published: 2020-12-24 - Earliest claimed: 2018-03-05 - Assignees: Mitsui Chemicals, Inc. - Applicants: Mitsui Chemicals, Inc. - Inventors: Yosuke ONO; Kazuo KOHMURA; Atsushi OKUBO; Daiki TANEICHI; Hisako ISHIKAWA; Tsuneaki BIYAJIMA - Web page: https://patentgrep.com/patent/US20200401039A1 ## CPC - G03F 1/64: characterised by the frames, e.g. structure or material, including bonding means therefor - G03F 1/62: Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof - G03F 7/2004: {characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light} - G03F 7/70983: {Optical system protection, e.g. pellicles or removable covers for protection of mask} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract To provide a pellicle in which outgas from an adhesive layer is suppressed. The pellicle includes a pellicle film, a support frame for supporting the pellicle film, a protrusion part arranged in the support frame, a first adhesive layer arranged on the protrusion part; and an inorganic material layer arranged at a position closer to the pellicle film than the first adhesive layer. The inorganic material layer may include a first inorganic material layer arranged at a first side surface of the first adhesive layer, the first side surface of the first adhesive layer intersecting the pellicle film, and arranged at a position closer to the pellicle film. ## Claims ### Claim 1 A pellicle comprising: a pellicle film; a support frame for supporting the pellicle film; a protrusion part arranged in the support frame; a first adhesive layer arranged on the protrusion part; and an inorganic material layer arranged at a position closer to the pellicle film than the first adhesive layer. ### Claim 2 (depends on 1) The pellicle according to claim 1, wherein the inorganic material layer comprises a first inorganic material layer arranged at a first side surface of the first adhesive layer, the first side surface of the first adhesive layer at a direction intersecting the pellicle film, and arranged at a position closer to the pellicle film. ### Claim 3 (depends on 2) The pellicle according to claim 2, wherein the first inorganic material layer is further arranged at a second side surface of the first adhesive layer opposing the first side surface. ### Claim 4 (depends on 2) The pellicle according to claim 2, wherein the first inorganic material layer is further arranged at a first end surface of the first adhesive layer opposing a surface in contact with the protrusion part. ### Claim 5 (depends on 2) The pellicle according to claim 2, further comprising: a filling layer arranged in the support frame, wherein the inorganic material layer comprises a second inorganic material layer instead of the first inorganic material layer or in addition to the first inorganic material layer, the second inorganic material layer arranged at a third side surface of the filling layer, the third side surface of the filling layer at a direction intersecting the pellicle film, and arranged in an area where the pellicle film is arranged. ### Claim 6 (depends on 5) The pellicle according to claim 5, wherein the second inorganic material layer and the filling layer are formed in a frame shape along a bottom surface of the support frame. ### Claim 7 (depends on 6) The pellicle according to claim 6, wherein the second inorganic material layer is further arranged at a fourth side surface of the filling layer opposing the third side surface, and a second end surface of the filling layer opposing a surface in contact with the support frame. ### Claim 8 (depends on 1) The pellicle according to claim 1, wherein the support frame comprises a first frame body connected with pellicle film, and a second frame body connected with the first frame body. ### Claim 9 (depends on 1) The pellicle according to claim 1, wherein the inorganic material layer is a metal layer. ### Claim 10 (depends on 9) The pellicle according to claim 9, wherein metal layer is made from a metal selected from a group of aluminum, titanium, iron, nickel, copper, ruthenium, titanium and gold, an alloy including at least two elements selected from the group, or an oxide including at least one or more elements selected from the group. ### Claim 11 (depends on 1) An exposure master plate comprising: a master plate; the pellicle according to claim 1, the pellicle attached to a surface of the master plate with a pattern. ### Claim 12 (depends on 11) An exposure device comprising: the exposure master plate according to claim 11. ### Claim 13 (depends on 11) An exposure device comprising: a light source for emitting an exposure light; the exposure master plate according to claim 11; and an optical system for guiding the exposure light emitted from the light source to the exposure master plate, wherein the exposure master plate is arranged so that the exposure light emitted from the light source transmits the pellicle film and irradiates to the exposure master plate. ### Claim 14 (depends on 13) The exposure device according to claim 13, wherein the exposure light is an Extreme Ultraviolet light. ### Claim 15 (depends on 11) A method of manufacturing a semiconductor device, comprising steps of: transmitting an exposure light emitted from a light source through the pellicle film of the exposure master plate according to claim 11, irradiate the exposure light to the master plate, and reflecting the exposure light on the master plate; and transmitting the exposure light reflected by the master plate through the pellicle film, irradiating the exposure light on a sensitive substrate, and thereby exposing the sensitive substrate in patterned shape.