# US 2020/0401009 A1 · Electrochromic element having protection layer

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- Number: US 2020/0401009 A1
- Document ID: US20200401009A1
- Status: Published application
- Kind: A1
- Application number: 16/444,215
- Filed: 2019-06-18
- Published: 2020-12-24
- Earliest claimed: 2019-06-18
- Assignees: Tintable Kibing Co., Ltd.
- Applicants: Tintable Kibing Co., Ltd.
- Inventors: YI-WEN CHUNG
- Web page: https://patentgrep.com/patent/US20200401009A1

## CPC

- G02F 1/153: Constructional details
- G02F 1/1533: {structural features not otherwise provided for}
- G02F 1/1523: comprising inorganic material
- G02F 1/1524: Transition metal compounds
- G02F 2001/1536: {additional, e.g. protective, layer inside the cell}
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS

## Abstract

An electrochromic element having a protection layer is disclosed which comprises a first base material, a first transparent conductive layer, a first electrochromic layer, a protection layer, an electrolytic layer, a second electrochromic layer, a second transparent conductive layer and a second base material arranged in order. The protection layer is made of tin oxide (SnOx) or nickel oxide (NiOx).

## Claims

### Claim 1

An electrochromic element having a protection layer, comprising a first base material, a first transparent conductive layer, a first electrochromic layer, a protection layer, an electrolytic layer, a second electrochromic layer, a second transparent conductive layer and a second base material arranged in order, wherein the protection layer is made of tin oxide (SnOx) or nickel oxide (NiOx).

### Claim 2 (depends on 1)

The electrochromic element having a protection layer as claimed in claim 1, wherein the first electrochromic layer is made of tungsten trioxide (WO3) and manufactured by an E-beam evaporation method, a method of an E-beam evaporation combined with an ion-beam assisted deposition, or a sputtering method.

### Claim 3 (depends on 1)

The electrochromic element having a protection layer as claimed in claim 1, wherein the second electrochromic layer is made of nickel(II) oxide (NiO) and manufactured by an E-beam evaporation method, a method of an E-beam evaporation combined with an ion-beam assisted deposition, or a sputtering method.

### Claim 4 (depends on 1)

The electrochromic element having a protection layer as claimed in claim 1, wherein the tin oxide (SnOx) has an O/Sn atomic ratio ranging from 1.5 to 2.5, and the nickel oxide (NiOx) has an O/Ni atomic ratio ranging from 0.5 to 1.5.

### Claim 5 (depends on 1)

The electrochromic element having a protection layer as claimed in claim 1, wherein the protection layer has a surface roughness ranging from 5 nm to 40 nm.

### Claim 6 (depends on 1)

The electrochromic element having a protection layer as claimed in claim 1, wherein the protection layer has a thickness ranging from 25 nm to 150 nm.

### Claim 7 (depends on 1)

The electrochromic element having a protection layer as claimed in claim 1, wherein the protection layer is manufactured by an E-beam evaporation method, a method of an E-beam evaporation combined with an ion-beam assisted deposition or a sputtering method.