# US 2020/0399752 A1 · Substrate film forming machine table and usage method

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- Number: US 2020/0399752 A1
- Document ID: US20200399752A1
- Status: Published application
- Kind: A1
- Application number: 16/975,805
- Filed: 2018-07-19
- Published: 2020-12-24
- Earliest claimed: 2018-03-02
- Assignees: Hkc Corporation Limited; Chongqing Hkc Optoelectronics Technology Co., Ltd.
- Applicants: Hkc Corporation Limited; Chongqing Hkc Optoelectronics Technology Co., Ltd.
- Inventors: Chengliang Chu
- Web page: https://patentgrep.com/patent/US20200399752A1

## CPC

- C23C 14/564: {Means for minimising impurities in the coating chamber such as dust, moisture, residual gases}
- C23C 14/566: {using a load-lock chamber}
- C23C 14/54: Controlling or regulating the coating process
- H10P 14/20: of semiconductor materials
- H10P 72/0604: {Process monitoring, e.g. flow or thickness monitoring}
- H10P 74/27: {Structural arrangements therefor}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A substrate film forming machine table and a usage method. The substrate film forming machine table comprises: a first substrate bearing inlet and outlet chamber; a second substrate bearing inlet and outlet chamber; a film forming chamber; an intermediate chamber; a pump set connected to the first substrate bearing inlet and outlet chamber; a second pump connected to the intermediate chamber; a third pump connected to the film forming chamber and the second substrate bearing inlet and outlet chamber; at least one backup pump, which is provided to connect to the film forming chamber and the second substrate bearing inlet and outlet chamber so as to extract air from the film forming chamber and the second substrate bearing inlet and outlet chamber when the third pump is damaged; or, connecting to the intermediate chamber so as to extract air from the intermediate chamber when the second pump is damaged.

## Claims

### Claim 1

A substrate film formation machine, comprising:
a first substrate bearer in-out cavity;
a second substrate bearer in-out cavity connected to the first substrate bearer in-out cavity;
a film formation chamber connected to the second substrate bearer in-out cavity;
an intermediate chamber connected to the film formation chamber;
a pump set comprising a plurality of first pumps that are connected to the first substrate bearer in-out cavity, so as to pump out air in the first substrate bearer in-out cavity;
a second pump connected to the intermediate chamber, so as to pump out air in the intermediate chamber;
a third pump connected to the film formation chamber and the second substrate bearer in-out cavity, so as to pump out air in the film formation chamber and the second substrate bearer in-out cavity; and
a first auxiliary pump connected to the film formation chamber and the second substrate bearer in-out cavity, so as to pump out air in the film formation chamber and the second substrate bearer in-out cavity in case the third pump is damaged.

### Claim 2 (depends on 1)

The substrate film formation machine according to claim 1, further comprising a second auxiliary pump, wherein the second auxiliary pump is connected to the intermediate chamber, so as to pump out air in the intermediate chamber in case the second pump is damaged.

### Claim 3 (depends on 1)

The substrate film formation machine according to claim 1, wherein the plurality of first pumps are M first pumps;
each of the first pumps is connected to the first substrate bearer in-out cavity, so as to pump out air in the first substrate bearer in-out cavity;
N of the M first pumps are reused as auxiliary pumps;
wherein M is a positive integer greater than or equal to 2, N is a positive integer greater than or equal to 1, and N<M.

### Claim 4 (depends on 3)

The substrate film formation machine according to claim 3, further comprising at least one first control switch, wherein one end of the first control switch is connected to the first pump reused as the auxiliary pump, and the other end of the first control switch is connected to the first substrate bearer in-out cavity.

### Claim 5 (depends on 1)

The substrate film formation machine according to claim 1, further comprising at least one second control switch, wherein one end of the second control switch is connected to the third pump, and the other end of the second control switch is connected to the first substrate bearer in-out cavity.

### Claim 6 (depends on 2)

The substrate film formation machine according to claim 2, wherein there is one first auxiliary pump, and there is one second auxiliary pump.

### Claim 7 (depends on 1)

The substrate film formation machine according to claim 1, further comprising a first monitoring device, a second monitoring device and an alarm device;
wherein the first monitoring device is configured to monitor whether the second pump works normally, and send a first alarm signal to the alarm device when the second pump does not work normally;
the second monitoring device is configured to monitor whether the third pump works normally, and send a second alarm signal to the alarm device when the third pump does not work normally; and
when receiving the first alarm signal, the alarm device is configured to play a pre-recorded first alarm sound or display a first alarm icon by using a display screen, and when receiving the second alarm signal, the alarm device is configured to play a pre-recorded second alarm sound or display a second alarm icon by using a display screen.

### Claim 8 (depends on 7)

The substrate film formation machine according to claim 7, further comprising a first vacuum gauge and a second vacuum gauge, wherein the first vacuum gauge is arranged in the film formation chamber or the second substrate bearer in-out cavity, and the second vacuum gauge is arranged in the intermediate chamber.

### Claim 9 (depends on 7)

The substrate film formation machine according to claim 7, wherein the first monitoring device is configured to determine, by monitoring operation parameters of the second pump, whether the second pump works normally; the second monitoring device is configured to determine, by monitoring operation parameters of the third pump, whether the third pump works normally; and the operation parameters comprise a working current, a working voltage, and a pumping speed.

### Claim 10

A substrate film formation machine, comprising:
a first substrate bearer in-out cavity;
a second substrate bearer in-out cavity connected to the first substrate bearer in-out cavity;
a film formation chamber connected to the second substrate bearer in-out cavity;
an intermediate chamber connected to the film formation chamber;
a pump set comprising a plurality of first pumps that are connected to the first substrate bearer in-out cavity, so as to pump out air in the first substrate bearer in-out cavity;
a second pump connected to the intermediate chamber, so as to pump out air in the intermediate chamber;
a third pump connected to the film formation chamber and the second substrate bearer in-out cavity, so as to pump out air in the film formation chamber and the second substrate bearer in-out cavity;
an auxiliary pump connected to the film formation chamber, the second substrate bearer in-out cavity and the intermediate chamber;
a first control switch, one end of the first control switch being connected to the second pump and the other end of the first control switch being connected to the intermediate chamber;
a second control switch, one end of the second control switch being connected to the third pump and the other end of the second control switch being connected to the film formation chamber and the second substrate bearer in-out cavity;
a third control switch, one end of the third control switch being connected to the auxiliary pump and the other end of the third control switch being connected to the film formation chamber and the second substrate bearer in-out cavity; and
a fourth control switch, one end of the fourth control switch being connected to the auxiliary pump and the other end of the fourth control switch being connected to the intermediate chamber.

### Claim 11 (depends on 10)

The substrate film formation machine according to claim 10, wherein the pump set comprises M first pumps, each of the first pumps is connected to the first substrate bearer in-out cavity, so as to pump out air in the first substrate bearer in-out cavity, and N of the M first pumps are reused as auxiliary pumps, wherein M is a positive integer greater than or equal to 2, N is a positive integer greater than or equal to 1, and N<M.

### Claim 12 (depends on 11)

The substrate film formation machine according to claim 11, further comprising at least one fifth control switch, wherein one end of the fifth control switch is connected to the first pump reused as the auxiliary pump, and the other end of the fifth control switch is connected to the first substrate bearer in-out cavity.

### Claim 13 (depends on 10)

The substrate film formation machine according to claim 10, further comprising at least one sixth control switch, wherein one end of the sixth control switch is connected to the third pump and the other end of the sixth control switch is connected to the first substrate bearer in-out cavity.

### Claim 14 (depends on 10)

The substrate film formation machine according to claim 10, wherein when the second pump and the third pump both work normally, the first control switch and the second control switch are turned on, and the third control switch and the fourth control switch are both turned off;
when the second pump is damaged, the first control switch is turned off, the fourth control switch is turned on, the second control switch is turned on, and the third control switch is turned off; and
when the third pump is damaged, the second control switch is turned off, the third control switch is turned on, the first control switch is turned on, and the fourth control switch is turned off.

### Claim 15 (depends on 10)

The substrate film formation machine according to claim 10, further comprising a first monitoring device, a second monitoring device and an alarm device;
wherein the first monitoring device is configured to monitor whether the second pump works normally, and send a first alarm signal to the alarm device when the second pump does not work normally;
the second monitoring device is configured to monitor whether the third pump works normally, and send a second alarm signal to the alarm device when the third pump does not work normally; and
when receiving the first alarm signal, the alarm device is configured to play a pre-recorded first alarm sound or display a first alarm icon by using a display screen, and when receiving the second alarm signal, the alarm device is configured to play a pre-recorded second alarm sound or display a second alarm icon by using a display screen.

### Claim 16 (depends on 15)

The substrate film formation machine according to claim 15, further comprising a first vacuum gauge and a second vacuum gauge, wherein the first vacuum gauge is arranged in the film formation chamber or the second substrate bearer in-out cavity, and the second vacuum gauge is arranged in the intermediate chamber.

### Claim 17 (depends on 15)

The substrate film formation machine according to claim 15, wherein the first monitoring device is configured to determine, by monitoring operation parameters of the second pump, whether the second pump works normally; the second monitoring device is configured to determine, by monitoring operation parameters of the third pump, whether the third pump works normally; and the operation parameters comprise a working current, a working voltage and a pumping speed.

### Claim 18 (depends on 10)

A method of using the substrate film formation machine according to claim 10, comprising:
determining whether the second pump and the third pump work normally;
if the second pump is damaged, turning off the first control switch and the third control switch, turning on the second control switch and the fourth control switch, and starting a second auxiliary pump; and
if the third pump is damaged, turning on the first control switch and the third control switch, turning off the second control switch and the fourth control switch, and starting a first auxiliary pump.

### Claim 19 (depends on 18)

The method of using the substrate film formation machine according to claim 18, wherein after the determining whether the second pump and the third pump are damaged, the method further comprises:
sending out a first alarm signal if the second pump is damaged; and
sending out a second alarm signal if the third pump is damaged, the first alarm signal being different from the second alarm signal.

### Claim 20 (depends on 18)

The method of using the substrate film formation machine according to claim 18, wherein after the determining whether the second pump and the third pump are damaged, the method further comprises: sending out a third alarm signal when the second pump and the third pump are both damaged.