Apparatus for the Temperature Control of a Substrate and Corresponding Production Method

Manufacturing method for an apparatus for controlling the temperature of a substrate, in particular of a wafer substrate, having the steps of:

• providing a plate-type main body having a substrate placement area;
• forming a first temperature-control device for controlling the temperature of the main body using a first temperature-control fluid, having a first plurality of separate annular channels inside the main body for circulating the first temperature-control fluid;
• forming a second temperature-control device for controlling the temperature of the main body using a second temperature-control fluid, having a second plurality of separate annular channels inside the main body for circulating the second temperature-control fluid;
• providing a first to fourth tube, wherein the first temperature-control fluid is able to be supplied to the first plurality of annular channels through the first tube and to be removed therefrom through the second tube and wherein the second temperature-control fluid is able to be supplied to the second plurality of annular channels through the third tube and to be removed therefrom through the fourth tube;
• wherein a first to fourth hole are formed in the main body, which communicate in each case with the first plurality of separate annular channels and the second plurality of separate annular channels;
• wherein the first tube is placed in the first hole of the main body and has respective first openings in the region of the first plurality of separate annular channels for supplying the first temperature-control fluid;
• wherein the second tube is placed in the second hole of the main body and has respective second openings in the region of the first plurality of separate annular channels for removing the first temperature-control fluid;
• wherein the third tube is placed in the third hole (B1L) of the main body and has respective third openings in the region of the second plurality of separate annular channels for supplying the second temperature-control fluid;
• and
• wherein the fourth tube is placed in the fourth hole of the main body and has respective fourth openings in the region of the second plurality of separate annular channels for removing the second temperature-control fluid.