Laser irradiation device, projection mask and laser irradiation method
AssigneeV Technology Co., Ltd.
InventorMichinobu Mizumura
Life of this patent
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Abstract
A laser irradiation device includes a light source that generates laser light; a projection lens that radiates the laser light to a predetermined region of an amorphous silicon thin film deposited on a thin film transistor; and a projection mask including a plurality of opening portions disposed on the projection lens and through which the laser light passes, wherein a predetermined pattern that is able to reduce diffraction of the laser light is formed at a peripheral edge portion of each of the plurality of opening portions.
Claims12
1-11. (canceled)
A laser irradiation device comprising:
- a light source that generates laser light;
- a projection lens that radiates the laser light to a predetermined region of an amorphous silicon thin film deposited on a thin film transistor;
- and
- a projection mask including a plurality of opening portions disposed on the projection lens and through which the laser light passes,
- wherein a predetermined pattern that is able to reduce diffraction of the laser light is formed at a peripheral edge portion of each of the plurality of opening portions.
A projection mask disposed on a projection lens that radiates laser light, comprising:
- a plurality of opening portions through which the laser light from the projection lens is transmitted to a predetermined region of an amorphous silicon thin film deposited on a thin film transistor,
- wherein a predetermined pattern that is able to reduce diffraction of the laser light is formed at a peripheral edge portion of each of the plurality of opening portions.
A laser irradiation method comprising:
- generating laser light;
- transmitting the laser light through a projection mask including a plurality of opening portions disposed on a projection lens and through which the laser light passes;
- and
- irradiating a predetermined region of an amorphous silicon thin film deposited on a thin film transistor with the laser light through the projection mask,
- wherein a predetermined pattern that is able to reduce diffraction of the laser light is formed at a peripheral edge portion of each of the plurality of opening portions.
Dependencies are inferred from the claim text.