Cyclical epitaxial deposition system
AssigneeGold Carbon Co., Ltd.
InventorsCHIEN-TE HSIEH, Yeou-Fu Lin, CHIA-HUNG CHAO
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Abstract
A cyclical epitaxial deposition system is provided. The cyclical epitaxial deposition system includes a deposition chamber, a conveyance device, and a gas distribution module. The conveyance device is used to continuously convey a substrate to pass through the deposition chamber along a conveyance path. The gas distribution module is disposed in the deposition chamber and located above the conveyance path. The gas distribution module includes a plurality of precursor gas nozzles and purge gas nozzles that are not in communication with one another so as to guide at least one precursor gas and at least one purge gas to different regions of the substrate at the same time.
Claims17
A cyclical epitaxial deposition system, comprising:
- a deposition chamber;
- a conveyance device used to continuously convey a substrate along a conveyance path through the deposition chamber;
- and
- a gas distribution module disposed in the deposition chamber and located above the conveyance path, wherein the gas distribution module includes a plurality of precursor gas nozzles that are not in communication with one another and at least one purge gas nozzle, so as to guide at least one precursor gas and at least one purge gas to different regions of the substrate at the same time.
Dependencies are inferred from the claim text.