Method of masking apertures in a component and processing the component
AssigneeGeneral Electric Company
InventorsSheng Xu, Yanfei Gu, Dalong Zhong
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Abstract
The present invention relates to a method of processing a component, wherein the component comprises at least one opening in a surface thereof, the method comprising: placing the component in an electrophoretic fluid comprising particles of a masking material as an electrode, applying a voltage to the component and a counter electrode of the component, depositing particles of the masking material in the electrophoretic fluid into the at least one aperture through electrophoresis to mask the at least one aperture; processing a surface of the component; and removing the masking material in the at least one opening.
Claims10
A method of processing a component, wherein the component comprises at least one opening in a surface thereof, the method comprising:
- placing the component in an electrophoretic fluid comprising particles of a masking material as an electrode, applying a voltage to the component and a counter electrode of the component, depositing particles of the masking material in the electrophoretic fluid into the at least one aperture through electrophoresis to mask the at least one aperture;
- processing a surface of the component;
- and
- removing the masking material in the at least one aperture.
A method of repairing a component, wherein the component comprises a substrate, an outer layer on the substrate, and at least one aperture extending through the outer layer and into the substrate, the method comprising:
- placing the component in an electrophoretic fluid comprising particles of a masking material as an electrode, applying a voltage to the component and a counter electrode of the component, depositing particles of the masking material in the electrophoretic fluid into the at least one aperture through electrophoresis to mask the at least one aperture;
- removing at least a portion of the outer layer;
- and
- removing the masking material in the at least one aperture.
Dependencies are inferred from the claim text.