Light-Directed Electrochemical Patterning of Copper Structures
AssigneeBoard of Trustees of the University of Arkansas
InventorsRobert H. Coridan, James M. Lowe
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Abstract
A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.
Claims23
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A method of creating a pattern on a substrate using electrodeposition and light comprising the steps of:
- on selected areas of said substrate, depositing material by electrodeposition and by illumination to create a deposition rate of material that is greater than in the non-illuminated areas;
- and
- reversing the polarity while maintaining the illumination of said selected areas to cause said non-illuminated areas to have a higher rate of dissolution than said selected areas.
Dependencies are inferred from the claim text.