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AssigneeRobert Bosch GmbH
InventorsOliver Schmidt, Marcus Guenther, Wladislaw Dobrygin
Estimating the term…
The invention relates to a substrate holder (1) comprising a first contact (3) for the supply of a potential Us to the substrate (2), a charging region (12) on the surface (11) of the substrate holder (1) being designed such that it can be charged (13) with ions (101, 102) from the ion source (104) of a coating facility (100), and/or a second contact (4) is provided by means of which a freely selectable potential UH different from the potential Us can be applied to an electrode region (14) on the surface (11) of the substrate holder (1). The invention also relates to a coating facility (100) comprising at least one ion source (104) and a first voltage source (106) that can be connected to the substrate to be coated (2) such that gas ions (101) and/or ions (102) of a coating material (103) can be accelerated in the direction of the substrate (2) from the ion source (104) by means of an electric potential Us applied to the substrate (2) from the first voltage source (106), at least one secondary surface (11, 105), towards which ions (101, 102) missing the substrate (2) move, being designed (13, 113) such that it can be charged with arriving ions (101, 102), and/or at least one second voltage source (107) being provided, which can be connected to the secondary surface (11, 105) such that a freely selectable potential Us different from the potential Us can be applied to said secondary surface (11, 105). The invention further relates to an operating method and to a computer program product.
A substrate holder (1) for mounting a substrate (2) in a coating system (100), in such a way that a surface (11) of the substrate holder (1) faces toward an ion source (104) of the coating system (100), the substrate holder comprising:
A coating system (100) having
The coating system (100) as claimed in claim 13, further comprising a controller (108) for the second voltage source (107) is provided, which is configured in order to track the potential UH to a change in the potential US, in such a way that the potential US is at a lower energy than the potential UH as seen by the ions (101, 102).
The coating system (100) as claimed in claim 13, further comprising a controller (108) for the second voltage source (107), which is configured to track the potential UH to (a) a change in properties of the ion reservoir (104), (b) to a change in the potential US, or both (a) and (b) in such a way that the potential UH is repulsive as seen by the ions (101, 102).
A method for operating a coating system (100), the method comprising:
(canceled)
A non-transitory computer-readable medium containing machine-readable instructions which, when they are executed on a computer with a coating system (100) connected thereto, cause the coating system to
Dependencies are inferred from the claim text.