Regulating deposition characteristics
AssigneeHewlett-Packard Development Company, L.P.
InventorsMauricio Seras Franzoso, Andreas Muller, Antonio Gracia Verdugo
Life of this patent
Estimating the term…
Abstract
A method for regulating a deposition characteristic of a rendering material in a rendering apparatus comprises determining a status of a material deposition structure, and adjusting a physical attribute of the material deposition structure.
Claims15
A method for regulating a deposition characteristic of a rendering material in a rendering apparatus, the method comprising:
- determining a status of a material deposition structure;
- and
- adjusting a physical attribute of the material deposition structure.
A rendering apparatus comprising a processor and a material deposition structure, the processor to:
- determine a current status of a material deposition structure using data representing previous use thereof;
- and
- trigger conditioning of the material deposition structure to adjust a physical attribute thereof.
A non-transitory machine-readable storage medium encoded with instructions executable by a processor of a rendering apparatus for provoking formation of a transitory film on a heating element of a nozzle structure in a print head of the rendering apparatus, the machine-readable storage medium comprising instructions to:
- determine whether the nozzle structure has been fired more than a threshold number of times in previous rendering operations;
- determine whether the nozzle structure is to be used in a subsequent rendering operation;
- and
- execute an increased servicing routine of the nozzle structure.
Dependencies are inferred from the claim text.