Gas abatement apparatus
AssigneeApplied Materials, Inc.
InventorsAdib KHAN, Qiwei LIANG, Sultan MALIK, Srinivas NEMANI, Rafika Smati, Joseph Ng, John O'Hehir
Life of this patent
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Abstract
Embodiments of the present disclosure relate to gas abatement apparatus and effluent management. The apparatus described herein include a high pressure process chamber and a containment chamber surrounding the process chamber. A high pressure fluid delivery module is in fluid communication with the high pressure process chamber and is configured to deliver a high pressure fluid to the process chamber. An effluent management module includes a muffler assembly to effluent pressure reduction and a plurality of scrubbers provide for treatment of effluent.
Claims20
A muffler assembly apparatus, comprising:
- a first muffler defining a first volume therein, the first muffler having a first port formed in a first end and a second port formed in a second end opposite the first port;
- a second muffler defining a second volume therein, the second muffler having a third port formed in a third end and a fourth port formed in the second muffler substantially opposite the third port;
- a third muffler defining a third volume therein, the third muffler having a fifth port formed therein and a sixth port formed therein substantially opposite the fifth port;
- a fourth muffler defining a fourth volume therein, the fourth muffler having a seventh port formed therein and an eighth port formed through a fourth end substantially opposite the seventh port;
- a first conduit extending between the seventh port and the fifth port;
- and
- a second conduit extending between the fourth port and the sixth port.
An effluent management apparatus, comprising:
- a muffler assembly, comprising:
- a first muffler defining a first volume therein;
- a second muffler defining a second volume therein;
- a third muffler defining a third volume therein;
- a fourth muffler defining a fourth volume therein;
- a first conduit extending between the fourth muffler and the third muffler;
- and
- a second conduit extending between the second muffler and the third muffler;
- a third conduit extending from the second muffler to a valve;
- and
- a first scrubber in fluid communication with the valve.
A high-pressure processing apparatus, comprising:
- a first chamber;
- a second chamber defining a process volume therein, the second chamber disposed within the first chamber;
- a muffler assembly, comprising:
- a first muffler defining a first volume therein;
- a second muffler defining a second volume therein;
- a third muffler defining a third volume therein;
- a fourth muffler defining a fourth volume therein;
- a first conduit extending between the fourth muffler and the third muffler;
- and
- a second conduit extending between the second muffler and the third muffler;
- a third conduit extending from the second muffler to a valve;
- and
- a first scrubber in fluid communication with the valve.
Dependencies are inferred from the claim text.