Etching apparatus and etching method
AssigneeTokyo Electron Limited
InventorsKoichi Nagami, Kazuya Nagaseki
Life of this patent
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Abstract
An etching apparatus includes: a placement table serving as a lower electrode and configured to place a workpiece to be subjected to an etching processing thereon; a DC power supply configured to generate a negative DC voltage applied to the placement table; and a controller configured to: periodically apply a negative DC voltage to the placement table from the DC power supply when the etching processing on the workpiece placed on the placement table is initiated, and decrease a frequency of the negative DC voltage applied to the placement table with an elapse of processing time of the etching processing.
Claims17
A plasma processing apparatus comprising:
- a plasma processing container;
- a workpiece placement table disposed in the plasma processing container;
- at least one electrode disposed in the placement table;
- at least one DC power supply electrically connected to the at least one electrode;
- and
- a controller configured to control the at least one DC power supply to:
- (i) apply a pulsed negative DC voltage to the at least one electrode from the at least one DC power supply;
- and
- (ii) decrease a frequency of the pulsed negative DC voltage applied to the at least one electrode over time.
A plasma etching apparatus comprising:
- a plasma processing container;
- a workpiece placement table disposed in the plasma processing container;
- at least one electrode disposed in the workpiece placement table;
- a DC power supply electrically connected to the at least one electrode;
- a radio-frequency power supply which applies a radio-frequency power to form a plasma in the plasma processing container;
- a controller configured to:
- (i) control the DC power supply to apply a pulsed negative DC voltage to the at least one electrode;
- (ii) control the radio-frequency power supply to commence application of the radio-frequency power to form the plasma and etch a workpiece on the workpiece placement table;
- (iii) after commencement of the application of the radio-frequency power, controlling the DC power supply to at least one of:
- decrease a frequency of the pulsed negative DC voltage applied to the at least one electrode or increase an absolute value of voltage applied to the at least one electrode.
Dependencies are inferred from the claim text.