Dual load lock chamber

A processing system, comprising:

• a factory interface;
• a substrate transfer chamber;
• one or more multi-chamber processing systems coupled to the substrate transfer chamber;
• a dual load lock chamber coupling the factory interface to the substrate transfer chamber, wherein the dual load lock chamber comprises:
• a first load lock chamber having a first interior volume and a first substrate support disposed within the first interior volume, wherein the first substrate support includes a first plurality of support surfaces vertically spaced apart to support a corresponding first plurality of substrates, and wherein adjacent ones of the first plurality of support surfaces are spaced apart at a fixed first predetermined distance;
• a second load lock chamber disposed adjacent to the first load lock chamber and having a second interior volume and a second substrate support disposed within the second interior volume, wherein the second substrate support includes a second plurality of support surfaces vertically spaced apart to support a corresponding second plurality of substrates, and wherein adjacent ones of the second plurality of support surfaces are spaced apart at a fixed second predetermined distance that less than the fixed first predetermined distance;
• and
• a vacuum robot disposed in the substrate transfer chamber and configured to transfer substrates between the dual load lock chamber and the one or more multi-chamber processing systems.