Inorganic metallic oxide thin film with composite crystal form and manufacturing method thereof
AssigneeSouth China University of Technology
InventorsRongsheng CHEN, Sunbin DENG, Hoising KWOK
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Abstract
Disclosed is an inorganic metal oxide thin film with an embedded crystal morphology, wherein the embedded crystal morphology is composed of crystalline grains and an amorphous matrix, the crystalline grains are embedded in the amorphous matrix, and the grain size ranges from 0.5 nm to 10 nm. Also provided is a manufacturing method of the inorganic metal oxide thin film with the embedded crystal morphology.
Claims10
An inorganic metal oxide thin film with an embedded crystal morphology, comprising an embedded crystal morphology which is composed of crystalline grains and an amorphous matrix, the crystalline grains are embedded in an amorphous matrix, and have grain sizes ranging from 0.5 to 10 nm.
A manufacturing method of an inorganic metal oxide thin film with an embedded crystal morphology, comprising a step of depositing raw material on a substrate by a magnetron sputtering or evaporation process, to form a layer of an inorganic metal oxide thin film,
- wherein the inorganic metal oxide thin film comprises crystalline grains and an amorphous matrix;
- and
- wherein the raw material comprises at least one crystalline inorganic metal oxide.
Dependencies are inferred from the claim text.