Back to results
US 2020/0350145 A1Published application
Batch type substrate processing apparatus
AssigneeEugene Technology Co., Ltd.
InventorJeong Hee JO
Life of this patent
Estimating the term…
Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus includes a tube configured to provide a processing space, a partition wall configured to provide a discharge space in which plasma is generated, a gas supply pipe configured to supply a process gas to the discharge space, and a plurality of electrodes configured to generate plasma in the discharge space. At least one of the plurality of electrodes is disposed outside the partition wall, and at least one of the plurality of electrodes is disposed inside the partition wall.
Claims16
A batch type substrate processing apparatus comprising:
- a tube configured to provide a processing space in which a plurality of substrates are accommodated;
- a partition wall which is separated from the processing space, provides a discharge space in which plasma is generated, and extends in a longitudinal direction of the tube;
- a gas supply pipe configured to supply a process gas required for processing the plurality of substrates to the discharge space;
- and
- a plurality of electrodes extending in the longitudinal direction of the tube and configured to generate plasma in the discharge space,
- wherein at least one of the plurality of electrodes is disposed outside the partition wall, and at least one of the plurality of electrodes is disposed inside the partition wall.
3 more elements
Dependencies are inferred from the claim text.