Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

A method of forming a thin film coating on a substrate comprising:

• a) providing an electrode positioned in a plasma source device having a first plasma-generating surface, wherein a macro-particle reduction coating is deposited on at least a portion of the first plasma-generating surface of the electrode, wherein the plasma source is configured to perform plasma-enhanced chemical vapor deposition;
• b) supplying a power source to which the electrode is electrically connected, wherein the power source supplies a voltage that alternates between positive and negative, and wherein the voltage is supplied to the electrode;
• c) producing a plasma;
• d) providing a substrate with at least one surface to be coated proximate to the plasma;
• e) supplying a first gas through the space and energizing, partially decomposing, or fully decomposing the first gas;
• and
• f) depositing the thin film coating on the at least one surface of the substrate, wherein the depositing includes one of bonding and condensing a chemical fragment of the first gas containing a desired chemical element for the thin film coating on the at least one surface of the substrate.