Batch type substrate processing apparatus
AssigneeEugene Technology Co., Ltd.
InventorJeong Hee JO
Life of this patent
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Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus includes a tube configured to provide a processing space, a partition wall configured to provide a discharge space in which plasma is generated, a gas supply pipe configured to supply a process gas to the discharge space, and a plurality of electrodes disposed outside the tube to generate the plasma in the discharge space. The tube has a plurality of recesses recessed inward from the outermost circumferential surface of the tube, and the plurality of electrodes are accommodated in the plurality of recesses, respectively.
Claims11
A batch type substrate processing apparatus comprising:
- a tube configured to provide a processing space in which a plurality of substrates are accommodated;
- a partition wall extending in a longitudinal direction of the tube and disposed inside the tube to provide a discharge space which is separated from the processing space and in which plasma is generated;
- a gas supply pipe configured to supply a process gas required for processing the plurality of substrates to the discharge space;
- and
- a plurality of electrodes extending in the longitudinal direction of the tube and disposed outside the tube to generate the plasma in the discharge space,
- wherein the tube has a plurality of recesses extending in the longitudinal direction of the tube and recessed inward from the outermost circumferential surface of the tube, and
- the plurality of electrodes are accommodated in the plurality of recesses, respectively.
Dependencies are inferred from the claim text.